首页> 外文期刊>Journal of Materials Science >Defect microstructures in epitaxial PbZr0.2Ti0.8O3 films grown on (001)SrTiO3 by pulsed laser deposition
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Defect microstructures in epitaxial PbZr0.2Ti0.8O3 films grown on (001)SrTiO3 by pulsed laser deposition

机译:通过脉冲激光沉积在(001)SrTiO3上生长的PbZr0.2Ti0.8O3外延薄膜中的缺陷微观结构

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Transmission electron microscopy has been used to investigate the character and distribution of the microstructural features in epitaxial (001) ferroelectric PbZr0.2Ti0.8O3 films grown on (001) SrTiO3 substrates by pulsed laser deposition. The TEM observations revealed that the films were predominantly c-oriented with embedded a(1)- and a(2)-oriented domains lying on {101} planes. The substrate/film interfaces contained arrays of edge-type misfit dislocations and there were extraordinarily high densities ( 10(10) cm(-2)) of threading dislocations in the films. The character and distribution of these features are consistent with the following relaxation sequence. Firstly, the lattice misfit between the phases is accommodated at the growth temperature by the introduction of misfit dislocations at the edges of island nuclei, and some of these dislocations are forced away from the interface to form threading segments upon island coalescence. Next, the film adopts the c-orientation upon cooling through the Curie temperature with a(1)- and a(2)-oriented domains being formed to ameliorate the self-strain of the transformation. Finally, some redistribution of the embedded domains and misfit dislocations occurs in response to stresses caused by expansion coefficient differences. The impact of these defects on the electrical and electromechanical properties of epitaxial ferroelectric properties is discussed. (c) 2006 Springer Science + Business Media, Inc.
机译:透射电子显微镜已被用于研究通过脉冲激光沉积在(001)SrTiO3衬底上生长的外延(001)铁电PbZr0.2Ti0.8O3薄膜中的微结构特征和特征。 TEM观察表明,该薄膜主要为c取向,且在{101}平面上嵌入a(1)和a(2)取向的畴。基底/膜界面包含边缘型错配位错的阵列,并且膜中的穿通位错的密度非常高( 10(10)cm(-2))。这些特征的特征和分布与以下松弛序列一致。首先,通过在岛核的边缘引入失配位错,将相之间的晶格失配容纳在生长温度下,并且在岛合并时迫使这些位错中的一些从界面移开以形成螺纹段。接下来,该膜在居里温度下冷却时采用c取向,形成a(1)和a(2)取向域,以改善转变的自应变。最后,响应于由膨胀系数差异引起的应力,发生了嵌入域的一些重新分布和失配位错。讨论了这些缺陷对外延铁电性能的电气和机电性能的影响。 (c)2006年Springer Science + Business Media,Inc.

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