机译:通过纳米球体光刻和化学气相沉积生产的外延硅纳米线的有序阵列
Max-Planck Institute for Microstructure Physics, Weinberg 2, D-06120 Halle, Germany Institut fuer Photonische Technologien Albert-Einstein-Strasse 9, D-07745 Jena, Germany;
rnEMPA, Swiss Federal Laboratories for Materials Testing and Research, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39,CH-3602 Thun, Switzerland;
rnEMPA, Swiss Federal Laboratories for Materials Testing and Research, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39,CH-3602 Thun, Switzerland;
rnEMPA, Swiss Federal Laboratories for Materials Testing and Research, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39,CH-3602 Thun, Switzerland;
rnMax-Planck Institute for the Science of Light, Guenther Scharowsky Str. 1, D-91058 Erlangen, Germany Institut fuer Photonische Technologien Albert-Einstein-Strasse 9, D-07745 Jena, Germany;
A1. Silicon nanowires; A2. Single crystal growth; A3. Chemical vapor deposition processes;
机译:通过纳米球体光刻和分子束外延生产的硅纳米线的有序阵列
机译:通过外延化学气相沉积获得的硅纳米线的光致发光
机译:通过等离子体增强化学气相沉积制备的垂直锥形硅纳米线阵列:合成,结构表征和光致发光
机译:硅纳米线阵列结合纳米光刻和金属辅助蚀刻
机译:使用远程等离子体化学气相沉积沉积外延硅/硅锗/锗和新型高k栅极电介质。
机译:金属辅助化学蚀刻的无光刻技术制造硅纳米线和纳米孔阵列
机译:通过纳米球面光刻(NSL)在激光生产的ZnO基板上控制ZnO纳米线阵列
机译:等离子体增强CVD(化学气相沉积)对硅的低温外延沉积