首页> 外文期刊>Journal of Crystal Growth >MBE growth and transport properties of silicon δ-doped GaAs/AlAs quantum well structures for terahertz frequency detection
【24h】

MBE growth and transport properties of silicon δ-doped GaAs/AlAs quantum well structures for terahertz frequency detection

机译:用于太赫兹频率检测的δ掺杂硅的GaAs / AlAs量子阱结构的MBE生长和传输特性

获取原文
获取原文并翻译 | 示例
       

摘要

We present the electrical characterization of n-type GaAs/AlAs multiple quantum well (MQW) structures designed for terahertz (THz) radiation sensing at cryogenic temperatures. The samples were grown by solid source molecular beam epitaxy (MBE) and were δ-doped with silicon atoms at each potential well center. Temperature dependent Hall effect data show that (ⅰ) the conduction in these planar doped structures is thermally activated below 180 K, (ⅱ) the free carriers sheet densities are near the metal-insulator transition, and (ⅲ) the low temperature mobility is controlled by ionized impurities scattering. The study of the magneto-transport properties at 1.3 K further indicates that only the fundamental electronic sub-band of the two-dimensional electronic gas is populated. The MQW samples were then processed into lateral mesa-shaped photodetectors to investigate their spectral response in the THz frequency range. The preliminary experimental results for the proposed detection scheme, which involves transitions in the confined shallow donor impurity states, are described.
机译:我们介绍了为低温下的太赫兹(THz)辐射传感而设计的n型GaAs / AlAs多量子阱(MQW)结构的电学表征。样品通过固体源分子束外延(MBE)进行生长,并在每个势阱中心处δ掺杂有硅原子。随温度变化的霍尔效应数据表明,(ⅰ)这些平面掺杂结构中的传导在180 K以下被热激活,(ⅱ)自由载流子片密度接近金属-绝缘体转变,并且(ⅲ)低温迁移率受到控制通过电离的杂质散射。对1.3 K处的磁输运性质的研究进一步表明,仅填充了二维电子气的基本电子子带。然后将MQW样品加工成横向台面形光电探测器,以研究其在THz频率范围内的光谱响应。描述了所提出的检测方案的初步实验结果,该方案涉及在受限的浅施主杂质态中的跃迁。

著录项

  • 来源
    《Journal of Crystal Growth》 |2010年第10期|p.1761-1765|共5页
  • 作者单位

    School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom Department of Electrical Engineering, University of South Carolina, Columbia, SC 29208, USA;

    School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom;

    School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom;

    School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, United Kingdom;

    Semiconductor Physics Institute, A Gostauto 11, LT-01108 Vilnius, Lithuania;

    Semiconductor Physics Institute, A Gostauto 11, LT-01108 Vilnius, Lithuania;

    Semiconductor Physics Institute, A Gostauto 11, LT-01108 Vilnius, Lithuania;

    Semiconductor Physics Institute, A Gostauto 11, LT-01108 Vilnius, Lithuania Institute of Applied Research, Vilnius University, Sauletekio ave. 9, LT-10222 Vilnius, Lithuania;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Characterization; A3. Molecular beam epitaxy; B2. Semiconducting gallium compounds; B3. Infrared devices;

    机译:A1。表征;A3。分子束外延;B2。半导体镓化合物;B3。红外线设备;
  • 入库时间 2022-08-17 13:19:19

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号