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Optical and electrical characterization of AlGaN/GaN high electron mobility transistors irradiated with 5 MeV protons

机译:用5 MeV质子辐照的AlGaN / GaN高电子迁移率晶体管的光电特性

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摘要

An AlGaN/GaN HEMT was irradiated with 5 MeV protons at a dose up to 2 × 10~(15)/cm~2. Photolumines-cence spectra measured at 5 K indicated that GaN lattice was severely damaged by collisions with high energy protons although distinct near band-edge features were still observable. An I_(DS)/-V_(DS) measurement showed that the current level was decreased by 43% after proton irradiation, and an I_(GS)-V_(GS) measurement suggested that damage at the metal-contact/AlGaN interface was minimal. Transistor operation was found to be resistant to proton irradiation, which was partially attributed to a self-healing mechanism in proximity to the AlGaN/GaN interface.
机译:用最高2×10〜(15)/ cm〜2的剂量的5 MeV质子辐照AlGaN / GaN HEMT。在5 K下测量的光致发光光谱表明,尽管仍然可以观察到明显的近带边特征,但GaN晶格受到与高能质子碰撞的严重破坏。 I_(DS)/-V_(DS)测量表明质子辐照后电流水平降低了43%,I_(GS)-V_(GS)测量表明金属接触/ AlGaN界面处的损伤为最小的。发现晶体管操作可抵抗质子辐照,这部分归因于AlGaN / GaN界面附近的自愈机制。

著录项

  • 来源
    《Journal of Crystal Growth》 |2011年第1期|p.62-64|共3页
  • 作者单位

    Department of Chemical & Biological Engineering, Korea University, Anam-dong, Seongbuk-gu, Seoul, Republic of Korea;

    D4555 Overlook Ave. SW, US Naval Research Laboratory, Washington DC 20375, USA;

    D4555 Overlook Ave. SW, US Naval Research Laboratory, Washington DC 20375, USA;

    D4555 Overlook Ave. SW, US Naval Research Laboratory, Washington DC 20375, USA;

    Department of Chemical Engineering, Dankook University, Yongin 448-701, South Korea;

    D4555 Overlook Ave. SW, US Naval Research Laboratory, Washington DC 20375, USA;

    D4555 Overlook Ave. SW, US Naval Research Laboratory, Washington DC 20375, USA;

    Department of Chemical & Biological Engineering, Korea University, Anam-dong, Seongbuk-gu, Seoul, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Photoluminescence; A1. Radiation; B2. Semiconducting Gallium Compounds; B3. High Electron Mobility Transistor;

    机译:A1。光致发光;A1。辐射;B2。半导体镓化合物;B3。高电子迁移率晶体管;

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