...
首页> 外文期刊>Journal of Crystal Growth >Quantum dots and quantum dashes in the narrow-gap InSb/InAsSbP system
【24h】

Quantum dots and quantum dashes in the narrow-gap InSb/InAsSbP system

机译:窄间隙InSb / InAsSbP系统中的量子点和量子破折号

获取原文
获取原文并翻译 | 示例
           

摘要

InSb quantum dots (QDs) and quantum dashes (Q-dashes) were obtained on InAs-rich substrate by both LPE and MOVPE methods. Bimodal mechanism of the formation of the InSb quantum dots was observed on InAs binary surface during the LPE growth. The low-density (5×10~8 cm~(-2)) big quantum dots with 12 nm in height and high-density (1×10~(10) cm~(-2)) small quantum dots with 4 nm in height were found to be present simultaneously. Deposition from the InSb melt over the InAs_(0.61)Sb_(0.13)P_(0.26) matrix layer lattice-matched with InAs substrate resulted in the uniformity of the InSb QDs. The Q-dashes with density (2.5×10~9 cm~(-2)) with dimensions of 30 nm in height, 500 nm in length and 200 nm in width were grown by the MOVPE method. The obtained Q-dashes were oriented along the [ 1 1 0] direction. A drastic change in the dot geometry with dependence on Ⅲ/Ⅴ ratio of the components in the vapor phase was observed. The shape and the density of the InSb Q-dashes can be determined by the surface chemistry of the InAs(Sb.P) matrix layer.
机译:通过LPE和MOVPE方法在富InAs的衬底上获得InSb量子点(QD)和量子破折号(Q-dash)。在LPE生长期间,在InAs二元表面上观察到形成InSb量子点的双峰机理。高度为12 nm的低密度(5×10〜8 cm〜(-2))大量子点和高度为4 nm的高密度(1×10〜(10)cm〜(-2))小量子点身高同时被发现。从与InAs衬底晶格匹配的InAs_(0.61)Sb_(0.13)P_(0.26)基质层上的InSb熔体中沉积会导致InSb QD的均匀性。利用MOVPE法生长出密度为2.5×10〜9 cm〜(-2),高度为30 nm,长度为500 nm,宽度为200 nm的Q-点。所获得的Q点沿[1 1 0]方向取向。观察到点几何形状的急剧变化取决于气相中组分的Ⅲ/Ⅴ比。 InSb Q划线的形状和密度可以通过InAs(Sb.P)基质层的表面化学性质来确定。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号