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首页> 外文期刊>Journal of Crystal Growth >Analysis of W-shape melt/crystal interface formation in Czochralski silicon crystal growth
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Analysis of W-shape melt/crystal interface formation in Czochralski silicon crystal growth

机译:Czochralski硅晶体生长中W形熔体/晶体界面形成的分析

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The shape of the melt/crystal interface in Czochralski grown silicon crystal is a result of the interaction of several phenomena. In particular, melt convection plays a key role as it affects the heat and mass transfer inside the melt. Depending on the growth conditions and heat transfer in the melt, the interface shape can evolve from a purely concave or convex shape to a W-shape. The aim of this study is to explore the heat transfer conditions and melt flow patterns leading to the formation of W-shape interfaces. The 2D simulations are performed for 6 in. diameter silicon in order to identify conditions leading to W-shape formation. The numerical results show that the formation and development of W-shape interfaces is associated with growth conditions favoring the appearance of a vortex underneath the crystal. This vortex significantly influences the thermal field within the crystallization zone and locally alters the interface deflection. This study suggests that the formation of the W-shape interfaces influences significantly the grown-in defects and crystal quality.
机译:切克劳斯基(Czochralski)生长的硅晶体中熔体/晶体界面的形状是多种现象相互作用的结果。特别是,熔体对流起着关键作用,因为它影响熔体内部的热量和质量传递。取决于生长条件和熔体中的热传递,界面形状可以从纯凹形或凸形演变成W形。这项研究的目的是探索导致W形界面形成的传热条件和熔体流动模式。对直径为6英寸的硅执行2D模拟,以识别导致形成W形的条件。数值结果表明,W形界面的形成和发展与有利于晶体下方涡流出现的生长条件有关。该涡旋显着影响结晶区内的热场,并局部改变界面偏转。这项研究表明,W形界面的形成会显着影响长大的缺陷和晶体质量。

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