首页> 外文期刊>Journal of Crystal Growth >Drift mobility measurements on undoped Cd_(0.9)Zn_(0.1)Te grown by high-pressure Bridgman technique
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Drift mobility measurements on undoped Cd_(0.9)Zn_(0.1)Te grown by high-pressure Bridgman technique

机译:高压布里奇曼技术生长的未掺杂Cd_(0.9)Zn_(0.1)Te的漂移迁移率测量

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摘要

The electron drift mobility of undoped Cd_(0.9)Zn_(0.1)Te grown by high-pressure Bridgman method is measured by time-of-flight technique. Room temperature mobility of 950 cm~2/Vs is measured, while it increases to 3000 cm~2/Vs at 100 K. The dominant scattering mechanism for the electron transport is discussed by comparing with the theoretical mobility obtained by iterative solution of the Boltzmann equation.
机译:采用飞行时间技术测量了高压布里奇曼法生长的未掺杂Cd_(0.9)Zn_(0.1)Te的电子漂移迁移率。测量室温下迁移率为950 cm〜2 / Vs,而在100 K下增加到3000 cm〜2 / Vs。通过与玻尔兹曼迭代解的理论迁移率比较,讨论了电子传输的主要散射机理。方程。

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