...
首页> 外文期刊>Journal of Computational Electronics >Electron subband dispersions in ultra-thin silicon films from a two-band k·p theory
【24h】

Electron subband dispersions in ultra-thin silicon films from a two-band k·p theory

机译:基于两波段k·p理论的超薄硅膜中电子子带的色散

获取原文
获取原文并翻译 | 示例

摘要

The electron subband structure in a thin (100) silicon film is analyzed based on a two-band k·p theory. For unprimed subbands the dependence of the nonparabolic-ity parameter on film thickness is obtained. The two-band k·p theory gives a thickness dependence of the effective masses for primed subbands. Limitations of the model are discussed. The importance of the nonparabolicity parameter dependence on the film thickness for transport is demonstrated.
机译:基于两波段k·p理论分析了(100)硅薄膜中的电子子带结构。对于未涂底漆的子带,获得了非抛物线性参数对薄膜厚度的依赖性。两带k·p理论给出了灌注底子带有效质量的厚度依赖性。讨论了模型的局限性。证明了非抛物线参数依赖于薄膜厚度进行运输的重要性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号