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首页> 外文期刊>Journal of Computational Electronics >A novel symmetrical 4H-SiC MESFET: an effective way to improve the breakdown voltage
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A novel symmetrical 4H-SiC MESFET: an effective way to improve the breakdown voltage

机译:新型对称4H-SiC MESFET:提高击穿电压的有效方法

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In this paper, a novel symmetrical structure (SS) of 4H-SiC metal semiconductor field effect transistor (MESFET) as an effective way to improve the breakdown voltage is presented. The key idea in this work is to improve the breakdown voltage, maximum output power density, and frequency parameters of the device using a symmetrical structure with recessed gate. The SS-MESFET modifies the electric field in the drift layer significantly. The influence of the SS-MESFET on the saturation current, breakdown voltage (V-BR), and small-signal characteristics of the SS-MESFET are studied by numerical device simulation. Using two-dimensional device simulation, we demonstrate that the breakdown voltage (V-BR) improved by factors 2.5 and 3.3 in comparison with an asymmetrical conventional MESFET structure (AC-MESFET) and a symmetrical conventional MESFET structure (SC-MESFET), respectively. Also, the maximum output power density (P-max) improved about by 93 and 250 % in comparison with the AC-MESFET and SC-MESFET structures, respectively. So, the SS-MESFET shows the superior maximum available gain (MAG), unilateral power gain (U), and current gain (h(12)) which is presenting the proposed structure is more suitable device for high power microwave applications.
机译:本文提出了一种新颖的4H-SiC金属半导体场效应晶体管(MESFET)对称结构(SS),作为提高击穿电压的有效方法。这项工作的关键思想是使用带有凹入式栅极的对称结构来改善器件的击穿电压,最大输出功率密度和频率参数。 SS-MESFET显着改变了漂移层中的电场。通过数值器件仿真研究了SS-MESFET对SS-MESFET的饱和电流,击穿电压(V-BR)和小信号特性的影响。使用二维器件仿真,我们证明与非对称常规MESFET结构(AC-MESFET)和对称常规MESFET结构(SC-MESFET)相比,击穿电压(V-BR)分别提高了2.5和3.3倍。而且,与AC-MESFET和SC-MESFET结构相比,最大输出功率密度(P-max)分别提高了约93%和250%。因此,SS-MESFET显示出优越的最大可用增益(MAG),单边功率增益(U)和电流增益(h(12)),这表明所提出的结构更适合于高功率微波应用。

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