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A 32 nm Read Disturb-free 11T SRAM Cell with Improved Write Ability*

机译:32 nm读取无干扰的11T SRAM单元,具有改进的写入能力*

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Data stability, write ability and leakage power are major concerns in submicron static random access memory (SRAM) cell design. This paper presents an 11T SRAM cell with differential write and single-ended read. Proposed cell offers improved write ability by interrupting its ground connection during write operation. Separate read buffer provides disturb-free read operation. Characteristics are obtained from HSPICE simulation using 32 nm high-performance predictive technology model. Simulation results show that the proposed cell achieves 4.5x and 1.06x higher read static noise margin (RSNM) as compared to conventional 6T (C6T) and PNN-based 10T cells, respectively, at 0.4 V. Write static noise margin (WSNM) of the proposed design is 1.65x, 1.71x and 1.77x larger as compared to those of C6T, PPN-based 10T and PNN-based 10T cells, respectively, at 0.4V. Write "1" delay of the proposed cell is 0.108x and 0.81x as those of PPN10T and PNN10T cells, respectively. Proposed circuit consumes 1.40x lesser read power as compared to PPN10T cell at 0.4 V. Leakage power of the proposed cell is 0.35x of C6T cell at 0.4 V. Proposed 11T cell occupies 1.65x larger area as compared to that of conventional 6T.
机译:数据稳定性,写入能力和泄漏功率是亚微米静态随机存取存储器(SRAM)单元设计的主要问题。本文介绍了具有差分写入和单端读取的11T SRAM单元。通过在写入操作期间中断其接地连接,提出的单元格提供了改进的写入能力。单独的读缓冲区提供无干扰读取操作。使用32 nm高性能预测技术模型从HSPICE仿真获得特征。仿真结果表明,与传统的6T(C6T)和基于PNN的10T细胞相比,所提出的电池达到4.5倍和1.06倍的读取静态噪声裕度(RSNM),在0.4V。写静电距离(WSNM)与C6T,基于PPN的10T和PNN的10T细胞相比,所提出的设计分别为1.65倍,1.71倍和1.77倍,分别为0.4V。写入“1”延迟所提出的单元的延迟分别为0.108倍和0.81倍,分别为PPN10T和PNN10T细胞。与0.4V的PPN10T电池相比,所提出的电路消耗1.40x较小的读取功率。所提出的电池的漏功率为0.4V的C6T电池。与传统6T相比,提出的11T电池占据1.65倍较大的区域。

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