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Sources of photoemission in Na3Sb thin films

机译:Na3Sb薄膜中的光发射源

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Na3Sb thin films were formed by first depositing an Sb layer and then depositing Na from a molecular‐beam source; the Na‐Sb reaction took place at room temperature. The average film composition during Na deposition was determined with a quartz crystal microbalance. Photoemissive spectral yield and photoelectron energy distribution data were obtained as a function of film composition. Values for band‐bending parameters, photosensitive layer thickness, and photothreshold energy were determined from an analysis of the spectral yield data. In the Na to Sb ratio range of approximately 2 : 1 to 3 : 1, the photosensitive layer thickness increases from less than 20 Å to greater than 300 Å, suggesting that the Na3Sb growth proceeds from the surface at the completion of Na2Sb growth. The threshold region of the spectral yield curves fits a model for indirect transitions from surface states at the Fermi energy. The energy distribution data confirm that the transitions are indirect. A separate peak in the energy distribution data is attributed to emission from bulk donor states.
机译:通过首先沉积一个Sb层,然后从分子束源中沉积Na来形成Na3Sb薄膜。 Na-Sb反应在室温下发生。用石英晶体微量天平测定Na沉积期间的平均膜组成。获得了作为膜组成的函数的光发射光谱产率和光电子能量分布数据。通过对光谱屈服数据的分析来确定带弯曲参数,光敏层厚度和光阈值能量的值。在Na与Sb之比大约为2:1至3:1的范围内,光敏层厚度从小于20Å增加至大于300Å,表明在Na2Sb生长完成时,Na3Sb从表面开始生长。光谱产率曲线的阈值区域适合于费米能量从表面态间接跃迁的模型。能量分布数据确认过渡是间接的。能量分布数据中一个单独的峰值归因于大量供体状态的发射。

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    《Journal of Applied Physics》 |1976年第8期|P.3471-3479|共9页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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