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Interpretation of the conductance and capacitance frequency dependence of hydrogenated amorphous silicon Schottky barrier diodes

机译:氢化非晶硅肖特基势垒二极管的电导和电容频率依赖性的解释

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We present a general model of the frequency dependence of conductance and capacitance in a‐Si:H Schottky diodes. In order to circumvent several questionable assumptions required in the analysis of capacitance voltage characteristics, the frequency dependence of sputtered a‐Si:H devices is measured with no applied dc voltage. We obtain independent, consistent values of the depletion width and of the density of states at the Fermi level and below from both conductance and capacitance at both low and high modulation frequencies. We show that the linear frequency dependence of conductance cannot be attributed to hopping conductance, but rather to the interaction of gap states with free carriers. Our study shows that the interaction kinetics of the states around the Fermi level with the conduction‐band carriers is so fast that the response of the diode is limited by the band transport of these carriers, which rapidly thermalize and distribute themselves through the continuum of states from the conduction band to the Fermi level.
机译:我们介绍了a-Si:H肖特基二极管中电导和电容的频率依赖性的一般模型。为了绕开分析电容电压特性所需的几个可疑假设,在没有施加直流电压的情况下测量了溅射的a-Si:H器件的频率依赖性。我们从低和高调制频率下的电导和电容获得耗尽宽度和费米能级以下的状态密度的独立,一致的值。我们表明电导的线性频率依赖性不能归因于跳跃电导,而是归因于间隙态与自由载流子的相互作用。我们的研究表明,费米能级附近的态与导带载流子的相互作用动力学是如此之快,以至于二极管的响应受到这些载流子的带传输的限制,这些载流子通过状态的连续性迅速使自身热化并分布从导带到费米能级

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    《Journal of Applied Physics》 |1980年第9期|P.4847-4854|共8页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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