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首页> 外文期刊>Journal of Applied Physics >N incorporation in GaInNSb alloys and lattice matching to GaSb
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N incorporation in GaInNSb alloys and lattice matching to GaSb

机译:在GaInNSb合金中掺入N和与GaSb晶格匹配

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The incorporation of N into MBE grown GaNSb and GaInNSb is investigated. Measurements of the N fraction in GaNSb show the familiar linear dependence on inverse growth rate, followed by a departure from this at low growth rates; a similar behaviour is observed for GaInNSb. Unexpectedly, the point at which there is a departure from this linear behaviour is found to be extended to lower growth rates by the addition of small amounts of In. These results are compared to a kinetic theory-based model from which it is postulated that the change in behaviour can be attributed to an In-induced change in the characteristic surface residence lifetime of the N atoms. In addition, a method is demonstrated for growing GaInNSb lattice-matched to GaSb(001) for compositions with band gaps covering the 2–5 μm region.
机译:研究了将N掺入MBE生长的GaNSb和GaInNSb中。 GaNSb中N分数的测量结果显示了对逆生长率的线性依赖关系,然后在低生长率时偏离了线性关系。对于GaInNSb,观察到类似的行为。出乎意料的是,发现通过添加少量的In可以将偏离线性行为的点扩展到较低的增长率。将这些结果与基于动力学理论的模型进行了比较,从该模型可以推测,行为的变化可归因于N原子特征表面停留寿命的In诱导变化。另外,对于带隙覆盖2–5μm区域的成分,已证明了一种生长与GaSb(001)晶格匹配的GaInNSb的方法。

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