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首页> 外文期刊>Journal of Applied Physics >Effect of point and grain boundary defects on the mechanical behavior of monolayer MoS2 under tension via atomistic simulations
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Effect of point and grain boundary defects on the mechanical behavior of monolayer MoS2 under tension via atomistic simulations

机译:原子模拟模拟点和晶界缺陷对单层MoS2拉伸力学行为的影响

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摘要

Atomistic simulation is used to study the structure and energy of defects in monolayer MoS2 and the role of defects on the mechanical properties of monolayer MoS2. First, energy minimization is used to study the structure and energy of monosulfur vacancies positioned within the bottom S layer of the MoS2 lattice, and 60° symmetric tilt grain boundaries along the zigzag and armchair directions, with comparison to experimental observations and density functional theory calculations. Second, molecular dynamics simulations are used to subject suspended defect-containing MoS2 membranes to a state of multiaxial tension. A phase transformation is observed in the defect-containing membranes, similar to prior work in the literature. For monolayer MoS2 membranes with point defects, groups of monosulfur vacancies promote stress-concentration points, allowing failure to initiate away from the center of the membrane. For monolayer MoS2 membranes with grain boundaries, failure initiates at the grain boundary and it is found that the breaking force for the membrane is independent of grain boundary energy.
机译:原子模拟用于研究单层MoS2中缺陷的结构和能量,以及缺陷对单层MoS2力学性能的作用。首先,将能量最小化用于研究位于MoS2晶格底部S层中的单硫空位的结构和能量,以及沿着之字形和扶手椅方向的60°对称倾斜晶界,并与实验观察和密度泛函理论计算进行比较。其次,使用分子动力学模拟使悬浮的含缺陷的MoS2膜处于多轴张力状态。在含缺陷的膜中观察到相变,类似于文献中先前的工作。对于具有点缺陷的单层MoS2膜,单硫空位组会促进应力集中点,从而使失效从膜中心开始。对于具有晶界的单层MoS2膜,破坏始于晶界,发现膜的断裂力与晶界能无关。

著录项

  • 来源
    《Journal of Applied Physics》 |2014年第1期|1-6|共6页
  • 作者单位

    Department of Mechanical Engineering, University of Arkansas, Fayetteville, Arkansas 72701, USA|c|;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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