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Experimental and numerical study of the plasma in coaxial capacitive coupled radio frequency discharge

机译:同轴电容耦合射频放电等离子体的实验性和数值研究

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摘要

A coaxial configuration of discharge is proposed for plasma surface treatment and possibly other applications. The reactor is based on a cylindrical structure, with the inner cylinder radio frequency powered (RF, 13.56 MHz) and the outer cylinder grounded, playing the role of a guard ring. The charged species can escape from the inner cavity through two longitudinal slits made in both cylinders, aligned to each other, and producing a linear slab of plasma. Hence, it is possible to project the plasma directly onto a surface placed under the slits, called external plate. The operation of this device is uniform and stable in argon for a large pressure range (0.8-50 mbar). Furthermore, simulations using the Plasimo™ software package were performed to evaluate the plasma parameters and to explain the experimental results. The ion flux on the surface exposed to this plasma increases when RF power increases, and the pressure or gap distance to the plate decreases. This cylindrical capacitive coupled plasma configuration can be very effective for surface treatment of different materials (conductors or insulators) on large area (when the plate or the system is moving perpendicular to the slits) due to energetic ions and active species released from the plasma.
机译:提出了一种用于等离子体表面处理和可能的其他应用的放电的同轴配置。反应器基于圆柱形结构,内筒射频功率(RF,13.56 MHz)和外筒接地,播放了保护环的作用。带电物种可以通过两个气缸中制造的两个纵向狭缝从内腔逸出,彼此对准并产生等离子体的线性板。因此,可以将等离子体直接突出到放置在狭缝下方的表面上,称为外板。该装置的操作在氩气中是均匀的,并且在大压力范围内(0.8-50毫巴)。此外,使用Plasimo™软件包进行模拟以评估等离子体参数并解释实验结果。当RF功率增加时,暴露于该等离子体的表面上的离子通量增加,并且与板的压力或间隙距离减小。该圆柱形电容耦合等离子体构造对于在大面积(当所述板或所述系统垂直于所述狭缝的时)的不同材料(导体或绝缘体)的表面处理非常有效,因此由于从等离子体释放的活性离子和活性物种。

著录项

  • 来源
    《Journal of Applied Physics》 |2021年第12期|123302.1-123302.15|共15页
  • 作者单位

    Laboratoire de Physique des Gaz et des Plasmas Universite Paris-Saclay CNRS F-91405 Orsay Cedex France;

    Laboratoire de Physique des Gaz et des Plasmas Universite Paris-Saclay CNRS F-91405 Orsay Cedex France;

    Laboratoire de Physique des Gaz et des Plasmas Universite Paris-Saclay CNRS F-91405 Orsay Cedex France;

    Laboratoire de Physique des Gaz et des Plasmas Universite Paris-Saclay CNRS F-91405 Orsay Cedex France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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