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首页> 外文期刊>Journal of Applied Physics >Charge coloration dynamics of electrochromic amorphous tungsten oxide studied by simultaneous electrochemical and color impedance measurements
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Charge coloration dynamics of electrochromic amorphous tungsten oxide studied by simultaneous electrochemical and color impedance measurements

机译:通过同时电化学和彩色阻抗测量研究电致变色无定形氧化钨的电荷着色动力学

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摘要

The coloration mechanisms in electrochromic systems can be probed by comparing the dynamics of the electrical and optical responses. In this paper, the linear frequency-dependent electrical and optical responses of an amorphous tungsten oxide thin film were measured simultaneously by a combination of two techniques-that is, electrochemical impedance spectroscopy (EIS) and the so-called color impedance spectroscopy. This was done at different bias potentials and their associated intercalation levels. Equivalent circuit fitting to the EIS spectra was used to extract the Faradaic components from the total impedance response. The latter were assigned to an intermediate adsorption step before the intercalation and to the diffusion of the electron-ion couple in the film. A quantity denoted complex optical capacitance was compared to the complex electrical capacitance-particularly, their expressions are related to the Faradaic processes. The coloration at low intercalation levels followed both the adsorption and diffusion phenomena. Conversely, the diffusion contribution was dominant at high intercalation levels and the adsorption one seemed to be negligible in this case. The complex spectra of perfectly synchronized electrical and optical responses are expected to differ only by a multiplying factor. This was the case at low intercalation levels, apart from small deviations at high frequencies. A clear departure from this behavior was observed as the intercalation level increased. A combination of frequency-dependent techniques, as presented here, can help to elucidate the dynamics of the coloration mechanisms in electrochromic materials at various conditions-for example, at different intercalation levels and optical wavelengths.
机译:通过比较电气和光学响应的​​动态来探测电致变色系统中的着色机制。本文通过两种技术的组合同时测量无定形氧化钨薄膜的线性频率依赖性电和光学响应 - 即电化学阻抗谱(EIS)和所谓的彩色阻抗光谱。这是以不同的偏见电位和相关的插入水平完成的。用于EIS光谱的等效电路用于从总阻抗响应中提取游览组件。后者被分配到嵌入前的中间吸附步骤以及膜中电子离子耦合的扩散。将表示复杂光学电容的量与复合电容进行比较 - 特别是,它们的表达与游览过程有关。低插入水平的着色遵循吸附和扩散现象。相反,在这种情况下,扩散贡献在高插入水平下显着,在这种情况下,吸附似乎可以忽略不计。预期完全同步电气和光学响应的​​复杂光谱仅在乘法因子中不同。除了在高频下的小偏差外,这是低插入水平的情况。随着嵌入水平的增加,观察到这种行为的清晰偏离。如本文所呈现的频率依赖性技术的组合可以帮助在各种条件下阐明电致变色材料中的着色机制的动态 - 例如,在不同的插层和光学波长。

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  • 来源
    《Journal of Applied Physics 》 |2021年第5期| 053103.1-053103.14| 共14页
  • 作者单位

    Department of Materials Science and Engineering The Angstroem Laboratory Uppsala University P.O. Box 35 SE-751 03 Uppsala Sweden;

    Department of Materials Science and Engineering The Angstroem Laboratory Uppsala University P.O. Box 35 SE-751 03 Uppsala Sweden;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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