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首页> 外文期刊>Journal of Applied Physics >Perturbation of charges in AlGaN/GaN heterostructures by ultraviolet laser illumination
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Perturbation of charges in AlGaN/GaN heterostructures by ultraviolet laser illumination

机译:紫外激光照射扰动AlGaN / GaN异质结构中的电荷

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Perturbation of charges in AlGaN/GaN heterostructures by ultraviolet (UV) laser illumination has been studied by Kelvin probe microscopy. It is observed that the charge dipole formed across the AlGaN barrier decreases under UV laser illumination, and typically takes a few days to a few weeks to revert back to the original equilibrium value. Bare surface barrier height of AlGaN/GaN heterostructures has been calculated based on the observed recovery transients after the UV illumination is switched off, and found to increase with Al alloy composition as well as thickness of the AlGaN layer. After SiNx passivation, the surface barrier is reduced, and the charges cannot be perturbed to a significant extent. It is further observed that by UV illumination through a quartz mask, surface barrier patterns can be imprinted on AlGaN/GaN heterostructures, which stay for several hours to several days. It is proposed that the imprinted patterns, with a spatial resolution similar to1-2 mum, are caused by surface trapping of photogenerated holes. (C) 2004 American Institute of Physics.
机译:开尔文探针显微镜已经研究了通过紫外线(UV)激光照射对AlGaN / GaN异质结构中的电荷的扰动。可以观察到,在紫外激光照射下,穿过AlGaN势垒形成的电荷偶极子会减少,通常需要几天到几周的时间才能恢复到原始平衡值。根据观察到的关闭UV照射后的恢复瞬态,可以计算出AlGaN / GaN异质结构的裸露表面势垒高度,发现其随铝合金成分和AlGaN层厚度的增加而增加。 SiNx钝化后,表面势垒减小,并且电荷不会受到很大程度的干扰。进一步观察到,通过通过石英掩模的紫外线照射,可以将表面势​​垒图案压印在AlGaN / GaN异质结构上,该结构可持续数小时至数天。提出具有空间分辨率类似于1-2μm的压印图案是由光生空穴的表面捕获引起的。 (C)2004美国物理研究所。

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