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首页> 外文期刊>Journal of Applied Physics >Diagnostic of the self-healing of metallized polypropylene film by modeling of the broadening emission lines of aluminum emitted by plasma discharge
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Diagnostic of the self-healing of metallized polypropylene film by modeling of the broadening emission lines of aluminum emitted by plasma discharge

机译:通过对等离子放电所发射的铝的加宽发射线进行建模,诊断金属化聚丙烯膜的自修复

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摘要

Metallized-film capacitors have the property, even under high continuous voltage, to self-heal i.e., to clear a defect in the dielectric. The self-healing process is a consequence of a transient arc discharge. It has been previously shown that during the discharge, due to Joule effect, the metal is vaporized until the arc extinguishes. The discharge duration has been found to be inversely proportional to the mechanical pressure applied on the layers of metallized films making up a capacitor. The aim of this study is to understand the physical processes involved in this spontaneous extinction of the arc discharge. Emission spectroscopy has been used to provide information about the physical properties (temperatures, electronic and neutral particles densities, etc.) of the plasma induces by a self-healing. An analysis, based on the broadenings and shifts of Al atomic lines, of the experimental light spectra obtained has shown that the self-healing process leads to the generation, from the vaporized metal, of a high-density and relatively weakly ionized aluminum plasma. The plasma density increases with the pressure applied on the film layers and, consequently, the density power needed to extend the plasma zone increases as well and the arc discharge goes out faster as experimentally observed.
机译:金属化膜电容器即使在高连续电压下也具有自我修复的性能,即清除电介质中的缺陷。自愈过程是瞬态电弧放电的结果。先前已经表明,在放电期间,由于焦耳效应,金属被汽化直到电弧熄灭。已经发现放电持续时间与施加在构成电容器的金属化膜层上的机械压力成反比。这项研究的目的是了解电弧放电自发熄灭涉及的物理过程。发射光谱已用于提供有关通过自愈引起的等离子体的物理性质(温度,电子和中性粒子密度等)的信息。根据铝原子线的展宽和移动对所获得的实验光谱进行的分析表明,自修复过程会导致从汽化金属生成高密度和相对弱电离的铝等离子体。等离子体密度随施加在薄膜层上的压力而增加,因此,扩展等离子体区域所需的密度功率也随之增加,并且如实验观察到的,电弧放电更快地消失。

著录项

  • 来源
    《Journal of Applied Physics》 |2005年第5期|p.053304.1-053304.9|共9页
  • 作者单位

    Laboratoire des Technologies de la Microelectronique, LTM/CNRS, CEA/LETI/DTS, 17 Avenue des Martyrs, 38054 Grenoble, Cedex 9, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

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