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首页> 外文期刊>Journal of Applied Physics >Thermal robustness in synthetic antiferromagnetic free layer for magnetic random access memory applications
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Thermal robustness in synthetic antiferromagnetic free layer for magnetic random access memory applications

机译:用于磁性随机存取存储器的合成反铁磁性自由层的热稳定性

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We have investigated the magnetic switching properties of synthetic antiferromagnetic (SyAF) structures consisting of Co_(90)Fe_(10)/Ru/Co_(90)Re_(10) structure with a Ru capping layer annealed at 300 ℃. After annealing, the coercivity H_c of the structures with a Co_(90)Fe_(10) thickness below 5 nm increased. On the other hand, the H_c was maintained below 70 Oe in structures with a Co_(90)Fe_(10) thickness above 6 nm after annealing. Thus, a low switching field for a free layer can be achieved by using the SyAF structures with a Ru capping layer, even after annealing at 300 ℃, and the SyAF free layer is considered to be effective for downsized memory cells in magnetic random access memories.
机译:我们研究了由Co_(90)Fe_(10)/ Ru / Co_(90)Re_(10)结构和在300℃退火的Ru覆盖层组成的合成反铁磁(SyAF)结构的磁开关性能。退火后,Co_(90)Fe_(10)厚度低于5 nm的结构的矫顽力H_c增加。另一方面,退火后,Co_(90)Fe_(10)厚度大于6 nm的结构中的H_c保持在70 Oe以下。因此,即使在300℃退火后,通过使用带有Ru盖层的SyAF结构也可以实现对自由层的低开关场,并且SyAF自由层被认为对于减小磁性随机存取存储器中的存储单元是有效的。 。

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