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Thermal robustness in synthetic antiferromagnetic free layer for magnetic random access memory applications

机译:用于磁随机存取存储器应用的合成反铁磁自由层的热稳健性

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We have investigated the magnetic switching properties of synthetic antiferromagnetic (SyAF) structures consisting of Co_(90)Fe_(10)/Ru/Co_(90)Re_(10) structure with a Ru capping layer annealed at 300 deg C. After annealing, the coercivity H_c of the structures with a Co_(90)Fe_(10) thickness below 5 nm increased. On the other hand, the H_c was maintained below 70 Oe in structures with a Co_(90)Fe_(10) thickness above 6 nm after annealing. Thus, a low switching field for a free layer can be achieved by using the SyAF structures with a Ru capping layer, even after annealing at 300 deg C, and the SyAF free layer is considered to be effective for downsized memory cells in magnetic random access memories.
机译:我们研究了由Co_(90)Fe_(10)/ Ru / Co_(90)Re_(10)结构组成的合成反铁磁体(SYAF)结构的磁性开关性能,其中Ru覆盖层在300℃下退火后退火,具有低于5nm以下的Co_(90)Fe_(10)厚度的结构的矫顽力H_c增加。另一方面,在退火后在6nm以上以高于6nm的CO_(90)Fe_(10)厚度,H_C在70 OE中保持在70°OE。因此,即使在300℃下退火之后,也可以通过使用带有Ru覆盖层的Syaf结构来实现用于自由层的低开关场,并且Syaf自由层被认为是磁随机接入中的小型存储器单元的有效性记忆。

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