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首页> 外文期刊>Journal of Applied Physics >Analytical modeling of edge effects on the residual stresses within the film/substrate systems. Ⅰ. Interfacial stresses
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Analytical modeling of edge effects on the residual stresses within the film/substrate systems. Ⅰ. Interfacial stresses

机译:边缘效应对膜/基底系统内残余应力的分析模型。 Ⅰ。界面应力

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Several analytical models have been developed to derive the closed-form solutions for the residual stresses at the interface when a film was overlaid on a substrate. In these models, the film edge effects on the interfacial stresses were analyzed. However, some of the existing models do not yield good results, and sometimes, they err in a fundamental manner in the prediction of the interfacial stress distribution. In this paper, an analytical model is developed to derive the closed-form solutions for the interfacial stress distributions along the film width. Compared to the existing analytical models, the present model is more rigorous and the analytical results agree better with the finite element results.
机译:已经开发了几种分析模型,以得出薄膜覆盖在基板上时界面处残余应力的闭合形式解。在这些模型中,分析了膜边缘对界面应力的影响。但是,某些现有模型不能产生良好的结果,有时,它们在预测界面应力分布方面有根本性的错误。在本文中,建立了一个分析模型,以得出沿薄膜宽度的界面应力分布的闭合形式解。与现有的分析模型相比,该模型更加严格,分析结果与有限元结果吻合较好。

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