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Incorporation of cobaltocene as an n-dopant in organic molecular films

机译:在有机分子膜中并入钴茂作为n型掺杂剂

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摘要

Electrical or chemical doping of molecular films is an efficient means of improving and controlling charge injection and carrier transport in organic devices. Recent work demonstrated that bis(cyclopentadienyl)cobalt(II) (cobaltocene, CoCp_2) efficiently dopes arntris(thieno)hexaazatriphenylene (THAP) derivative, as shown by a 0.56 eV shift of the Fermi level toward the empty states and an increase of current density by a factor of 10~3 over undoped THAP devices. In this work, a combination of x-ray photoemission spectroscopy and Rutherford backscattering is used to elucidate the details of dopant incorporation into bulk films. Cobaltocene is observed to codeposit into the THAP matrix in a controllable manner, with preferential adsorption of the dopant onto the surface of the host film. In the case of CoCp_2-doped tris(8-hydroxy-quinolinato) aluminum (Alq_3) films, negligible amounts of the dopant are found in the bulk matrix and on the film surface, resulting in minimal improvements in the electrical characteristics of doped Alq_3 films. The process of CoCp_2 adsorption onto a film surface or the evolving surface of a growing film which leads to dopant incorporation is likely assisted by charge transfer from cobaltocene to the host material, resulting in ion pairing between the dopant and host.
机译:分子膜的电或化学掺杂是改善和控制有机器件中电荷注入和载流子传输的有效手段。最近的工作表明,双(环戊二烯基)钴(II)(钴茂,CoCp_2)有效地掺杂了arntris(thieno)hexaazatriphenylene(THAP)衍生物,如费米能级向空态的0.56 eV位移和电流密度的增加所表明的那样。相对于未掺杂的THAP器件,其误差约为10〜3倍。在这项工作中,结合使用X射线光电子能谱和卢瑟福反向散射来阐明掺入体膜中的掺杂剂的细节。观察到钴茂以可控的方式共沉积在THAP基质中,并且掺杂剂优先吸附在主体膜的表面上。在掺杂CoCp_2的三(8-羟基-喹啉基)铝(Alq_3)薄膜的情况下,在本体基质和薄膜表面发现少量的掺杂剂,导致掺杂的Alq_3薄膜的电学特性仅有最小的改善。 。 CoCp_2吸附到薄膜表面或正在生长的薄膜的演化表面上(导致掺杂剂掺入)的过程很可能是通过从钴茂金属到基质材料的电荷转移来辅助的,从而导致掺杂剂和基质之间的离子配对。

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