首页> 外文期刊>Journal of Crystal Growth >Carbon reduction and antimony incorporation in InGaAsSb films grown by metalorganic molecular beam epitaxy using tris-dimethylaminoantimony
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Carbon reduction and antimony incorporation in InGaAsSb films grown by metalorganic molecular beam epitaxy using tris-dimethylaminoantimony

机译:使用三-二甲基氨基锑通过金属有机分子束外延生长的InGaAsSb薄膜中的碳还原和锑掺入

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摘要

InGaAsSb layers nearly lattice-matched to InP were grown by metalorganic molecular beam epitaxy using tris-dimethylaminoantimony (TDMASb). Secondary-ion mass spectroscopy measurements revealed that TDMASb is useful not only as an Sb source but also as an additive that reduces the incorporation of C into the film from group-Ill metalorganic sources. In the room-temperature photoluminescence spectrum, the incorporation of Sb into InGaAs shifted the peak wavelength from 1.66 to 1.75μm and, simultaneously, the peak intensity of InGaAsSb became more than twice that of InGaAs.
机译:使用三甲基二甲基氨基锑(TDMASb)通过金属有机分子束外延生长与InP晶格匹配的InGaAsSb层。二次离子质谱法测量表明,TDMASb不仅可用作Sb来源,而且还可用作减少C离子从III族金属有机来源掺入薄膜的添加剂。在室温光致发光光谱中,向InGaAs中掺入Sb可使峰波长从1.66μm移至1.75μm,同时,InGaAsSb的峰强度变为InGaAs的峰强度的两倍以上。

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