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首页> 外文期刊>Journal of Applied Physics >Formation of dysprosium silicide nanowires on Si(557) with two-dimensional electronic structure
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Formation of dysprosium silicide nanowires on Si(557) with two-dimensional electronic structure

机译:具有二维电子结构的Si(557)上硅化纳米线的形成

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The self-organized growth of dysprosium silicide nanowires on Si(557) has been studied using scanning tunneling microcopy and angle-resolved photoelectron spectroscopy. The nanowires grow on the (111) facets of the Si(557) surface with lengths exceeding 1000 nm and widths of 3-5 nm. Their metallic electronic structure shows a two-dimensional behavior with a strong dispersion, which is both parallel and perpendicular to the nanowires. For Dy coverages of around 2 A, it is demonstrated that the nanowires consist of hexagonal DySi_2 monolayers, while at higher coverages they are predominantly formed from Dy_3Si_5 multilayers.
机译:使用扫描隧道显微镜和角度分辨光电子能谱研究了硅化纳米线在Si(557)上的自组织生长。纳米线以超过1000 nm的长度和3-5 nm的宽度在Si(557)表面的(111)面上生长。它们的金属电子结构表现出二维行为,具有很强的分散性,既平行又垂直于纳米线。对于大约2 A的Dy覆盖率,已证明纳米线由六边形DySi_2单层组成,而在更高的覆盖率下,它们主要由Dy_3Si_5多层形成。

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