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首页> 外文期刊>Journal of Applied Physics >Band alignment at the hybrid heterojunction between S-passivated III-V semiconductors and C_(60)
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Band alignment at the hybrid heterojunction between S-passivated III-V semiconductors and C_(60)

机译:S钝化的III-V半导体与C_(60)之间的混合异质结处的能带对准

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摘要

The interface between C_(60) and several commonly used S-passivated III-V semiconductors was studied using x-ray and ultraviolet photoelectron spectroscopy. It is found that the band alignment for S-passivated III-V semiconductors used in real devices differs significantly from that of in situ-prepared surfaces previously reported. The energy-level alignment is found to be nearly identical for the different III-V semiconductors. This phenomenon is explained by Fermi level pinning, which is consistent with interface dipole theory from traditional semiconductor device physics.
机译:使用X射线和紫外光电子能谱研究了C_(60)与几种常用的S钝化的III-V半导体之间的界面。发现在实际设备中使用的S钝化III-V半导体的能带对准与先前报道的原位制备表面的能带对准明显不同。发现对于不同的III-V族半导体,能级对准几乎是相同的。费米能级钉扎可以解释这种现象,这与传统半导体器件物理学中的界面偶极子理论是一致的。

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  • 来源
    《Journal of Applied Physics》 |2009年第5期|056105.1-056105.3|共3页
  • 作者单位

    Department of Materials Science and Engineering, University of Toronto, 184 College St., Toronto, Ontario M5S 3E4, Canada;

    Department of Materials Science and Engineering, University of Toronto, 184 College St., Toronto, Ontario M5S 3E4, Canada;

    Department of Materials Science and Engineering, University of Toronto, 184 College St., Toronto, Ontario M5S 3E4, Canada;

    Department of Materials Science and Engineering, University of Toronto, 184 College St., Toronto, Ontario M5S 3E4, Canada;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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