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Intrinsically limited mobility of the two-dimensional electron gas in gated AIGaN/GaN and AIGaN/AIN/GaN heterostructures

机译:栅电子AIGaN / GaN和AIGaN / AIN / GaN异质结构中二维电子气的固有迁移率受到限制

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摘要

We report on the intrinsically limited low-field mobility of the two-dimensional electron gas (2DEG) in gated AlGaN/GaN and AlGaN/AlN/GaN heterostructures. Monte Carlo transport simulations are carried out to calculate the room-temperature 2DEG mobilities in dependence on the electron sheet density. The simulated 2DEG mobilities are compared to the phonon-limited mobility of bulk GaN. We estimate a maximum 2DEG mobility of about 2700 cm~2 V~(-1) s~(-1) for an electron sheet density of ~5 × 10~(12) cm~(-2), which remarkably exceeds the phonon-limited bulk mobility of 1520 cm~2 V~(-1) s~(-1). By reducing the electron sheet density below 5 × 10~(12) cm~(-2), i.e., in a weak electron quantum confinement regime, the room-temperature 2DEG mobility gradually decreases and approaches the phonon-limited bulk value for vanishing quantum confinement. The insertion of a thin AlN barrier interlayer improves transport properties of the 2DEG and the mobility substantially increases due to a suppression of the alloy scattering.
机译:我们报告了在门控的AlGaN / GaN和AlGaN / AlN / GaN异质结构中二维电子气(2DEG)的固有有限的低场迁移率。进行了蒙特卡洛输运模拟,以计算取决于电子片密度的室温2DEG迁移率。将模拟的2DEG迁移率与块状GaN的声子限制迁移率进行了比较。对于〜5×10〜(12)cm〜(-2)的电子片密度,我们估计最大2DEG迁移率约为2700 cm〜2 V〜(-1)s〜(-1),显着超过声子极限迁移率为1520 cm〜2 V〜(-1)s〜(-1)。通过将电子片密度降低到5×10〜(12)cm〜(-2)以下,即在弱电子量子约束状态下,室温2DEG迁移率逐渐降低并接近声子极限体积值,从而消失了量子禁闭。薄的AlN势垒中间层的插入改善了2DEG的传输性能,并且由于抑制了合金散射,迁移率显着提高。

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  • 来源
    《Journal of Applied Physics》 |2009年第2期|023715.1-023715.5|共5页
  • 作者单位

    Fachgebiet Festkoerperelektronik, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

    Fachgebiet Festkoerperelektronik, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

    Institut fuer Mikro-und Nanotechnologien, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

    Institut fuer Mikro-und Nanotechnologien, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

    Institut fuer Mikro-und Nanotechnologien, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

    Institut fuer Mikro-und Nanotechnologien, Technische Universitaet Ilmenau, PF 100565, 98684 Ilmenau, Germany;

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  • 正文语种 eng
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