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Magnetic properties of thin hard/soft-stacked dot arrays with a large uniaxial magnetic anisotropy

机译:具有大单轴磁各向异性的薄硬/软堆叠点阵的磁性能

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摘要

Magnetic properties of hard/soft stacked dot arrays consisting of thin Co/Pt superlattice hard layers (3.6 nm in thickness, uniaxial magnetic anisotropy, K_u=1.3 × 10~7 erg/cm~3) and Co soft layers, with dot diameters of 30-40 nm, were investigated as functions of Co soft layer thickness and the interfacial exchange coupling between the hard and soft layers. Pt was used as the control layer of the interfacial exchange coupling, and Co soft layers were sandwiched with Pt layers to induce surface anisotropy on the Co soft layers. The remanence coercivity, H_r, was 2.7 kOe for Co/Pt(3.6 nm)/Co(4 nm) stacked dot arrays and 3.2 kOe for Co/Pt(3.6 nm)/Pt(1.2 nm)/Co(3 nm) stacked dot arrays, and these values were less than half that of single hard layer dot arrays (7.1 kOe). H_r was nearly constant in the φ range from 0° to about 45° (φ is the applied field angle from the easy axis), and increased significantly as φ increased further, as theoretically predicted. Hard/soft dot arrays maintained a relatively large K_u due to the surface anisotropy of the Co soft layers. It was suggested that the ratio of magnetic energy to the thermal energy, K_u~(eff)V/kT, for Co/Pt(3.6 nm)/Pt(1.2 nm)/ Co(3 nm) hard/soft dot arrays was 1.5 times larger than that for Co/Pt(3.6 nm) single dot arrays because of the relatively large K_u.
机译:由薄Co / Pt超晶格硬层(厚度3.6 nm,单轴磁各向异性,K_u = 1.3×10〜7 erg / cm〜3)和Co软层组成的硬/软堆叠点阵列的磁性能,点直​​径为研究了30-40 nm作为Co软层厚度和硬层与软层之间的界面交换耦合的函数。 Pt被用作界面交换耦合的控制层,Co软层与Pt层夹在中间,以在Co软层上引起表面各向异性。剩磁矫顽力H_r对于Co / Pt(3.6 nm)/ Co(4 nm)堆叠点阵列为2.7 kOe,对于Co / Pt(3.6 nm)/ Pt(1.2 nm)/ Co(3 nm)堆叠为3.2 kOe点阵列,这些值小于单硬层点阵列(7.1 kOe)的一半。 H_r在从0°到大约45°的φ范围内几乎恒定(φ是从易轴施加的视场角),并且如理论上所预测的那样,随着φ的进一步增加而显着增加。硬/软点阵列由于Co软层的表面各向异性而保持相对较大的K_u。建议对于Co / Pt(3.6 nm)/ Pt(1.2 nm)/ Co(3 nm)硬/软点阵列,磁能与热能之比K_u〜(eff)V / kT为1.5由于K_u相对较大,因此它比Co / Pt(3.6 nm)单点阵列的尺寸大两倍。

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  • 来源
    《Journal of Applied Physics》 |2009年第2期|834-836|共3页
  • 作者单位

    Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

    Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

    Institute of Multidisciplinary Research for Advanced Material, Tohoku University, Sendai 980-8577, Japan;

    Institute of Multidisciplinary Research for Advanced Material, Tohoku University, Sendai 980-8577, Japan;

    Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

    Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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