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首页> 外文期刊>Journal of Applied Physics >Preparation Of Silicon Nanowires By Hydrothermal Deposition On Silicon Substrates
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Preparation Of Silicon Nanowires By Hydrothermal Deposition On Silicon Substrates

机译:水热沉积在硅衬底上制备硅纳米线

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Smooth silicon nanowires (SiNWs) without metallic catalysts have been prepared using silicon monoxide as starting material by hydrothermal deposition on silicon substrates. Scanning electron microscopy and transmission electron microscopy demonstrate that SiNWs have smooth surfaces and around 170 nm in diameter as well as larger than 10 μm in length. High-resolution transmission electron microscopy shows that each nanowire consists a polycrystalline silicon core and an amorphous silica sheath. Si and silicon oxide, is proposed, are generated from silicon monoxide under high temperature and high pressure of hydrothermal conditions. The growth mechanism of silicon nanowires is proposed as the oxide-assisted growth mechanism.
机译:使用一氧化硅作为起始材料,通过在硅基板上进行水热沉积,制备了不含金属催化剂的光滑硅纳米线(SiNWs)。扫描电子显微镜和透射电子显微镜表明,SiNW具有光滑的表面,直径约为170 nm,长度大于10μm。高分辨率透射电子显微镜显示,每条纳米线均包含一个多晶硅芯和一个非晶硅皮。提出了在高温高压和水热条件下由一氧化硅产生Si和氧化硅。提出了硅纳米线的生长机理作为氧化物辅助生长机理。

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