首页> 外文期刊>Journal of Applied Physics >Defects in gallium nitride nanowires: First principles calculations
【24h】

Defects in gallium nitride nanowires: First principles calculations

机译:氮化镓纳米线中的缺陷:第一原理计算

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Atomic configurations and formation energies of native defects in an unsaturated GaN nanowire grown along the [001] direction and with (100) lateral facets are studied using large-scale ab initio calculation. Cation and anion vacancies, antisites, and interstitials in the neutral charge state are all considered. The configurations of these defects in the core region and outermost surface region of the nanowire are different. The atomic configurations of the defects in the core region are same as those in the bulk GaN, and the formation energy is large. The defects at the surface show different atomic configurations with low formation energy. Starting from a Ga vacancy at the edge of the side plane of the nanowire, a N-N split interstitial is formed after relaxation. As a N site is replaced by a Ga atom in the suboutermost layer, the Ga atom will be expelled out of the outermost layers and leaves a vacancy at the original N site. The Ga interstitial at the outmost surface will diffuse out by interstitialcy mechanism. For all the tested cases N-N split interstitials are easily formed with low formation energy in the nanowires, indicating N_2 molecular will appear in the GaN nanowire, which agrees well with experimental findings.
机译:使用大规模从头算计算,研究了沿[001]方向生长并具有(100)个侧面的不饱和GaN纳米线中的自然缺陷的原子构型和形成能。中性电荷状态下的阳离子和阴离子空位,反位点和间隙均被考虑。这些缺陷在纳米线的芯区域和最外表面区域中的构型是不同的。芯区域中的缺陷的原子构型与体GaN中的缺陷的原子构型相同,并且形成能量大。表面缺陷显示低形成能的不同原子构型。从纳米线的侧面的边缘处的Ga空位开始,在弛豫之后形成N-N裂隙。当最外层的一个N原子被一个Ga原子取代时,该Ga原子将从最外层中排出,并在原始N原子上留下一个空位。最外层的Ga间隙将通过间隙机制扩散出去。对于所有测试情况,N-N裂隙很容易在纳米线中形成,形成能低,表明N_2分子将出现在GaN纳米线上,这与实验结果非常吻合。

著录项

  • 来源
    《Journal of Applied Physics》 |2010年第4期|p.044305.1-044305.6|共6页
  • 作者单位

    Department of Applied Physics, University of Electronic Science and Technology of China, Chengdu 610054, People's Republic of China State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, People's Republic of China;

    rnState Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, People's Republic of China;

    Pacific Northwest National Laboratory, P.O. Box 999, Richland, Washington 99352, USA;

    rnPacific Northwest National Laboratory, P.O. Box 999, Richland, Washington 99352, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号