机译:离子聚焦在增强的辉光放电等离子体中将氢和氮离子注入硅中
Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong;
Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong Department 702, School of Mechanical and Automation Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100191, People's Republic of China;
Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong Department 702, School of Mechanical and Automation Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100191, People's Republic of China;
Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong;
Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong;
机译:离子聚焦在增强的辉光放电等离子体浸没离子向硅中注入氢和氮
机译:电子聚焦电场增强辉光放电等离子体浸没离子注入中等离子体分布的研究
机译:氮等离子体浸没离子注入中增强的辉光放电动力学的转变
机译:利用脉冲高压辉光放电等离子体浸没离子注入和沉积增强磷注入的类金刚石碳膜的生物相容性
机译:通过等离子体注入氧气和等离子体浸没离子注入进行分离,以形成绝缘体上硅。
机译:辉光放电等离子体处理对氧化锆表面增强骨细胞状细胞分化和抗微生物作用
机译:通过等离子体浸渍离子注入和氮化在闪光放电中的表面硬化,电动静电隔音
机译:添加到阅览室阅读软件下载与<<辉光放电分解制备离子镀和氢化非晶硼薄膜制备氢化非晶硅薄膜及其表征>>相似的文献。最终报告,1980年4月1日至1981年5月31日