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Surface and interface states of gallium-polar versus nitrogen-polar GaN: Impact of thin organic semiconductor overlayers

机译:镓极性氮化镓与氮极性GaN的表面和界面状态:薄有机半导体覆盖层的影响

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摘要

Using ultraviolet photoemission spectroscopy and x-ray photoemission spectroscopy, we have investigated the electronic properties of interfaces between copper phthalocyanine (CuPc) films and gallium-polar (Ga-polar) and nitrogen-polar (N-polar) GaN surfaces, respectively. Prior to the deposition of CuPc films, the clean Ga-polar and N-polar surfaces exhibited about 0.6 and 0.13 eV upward band bendings, respectively, showing the influence of electronic states on the surface termination and growth direction. With the deposition of ultrathin layers of CuPc, no additional band bending or charge displacement was observed for the Ga-polar heterointerface. In contrast, the N-polar interface exhibited an additional 0.54 eV band bending upon deposition of only a CuPc monolayer, attributed to a partial electron displacement from GaN to CuPc. The difference between the two cases is interpreted in terms of the difference between the electron affinity of the N-polar and Ga-polar GaN surfaces. With potential device use in mind, GaN/CuPc hybrid photodetector devices were fabricated and their photocurrent responses were investigated for possible applications as photosensors.
机译:使用紫外光发射光谱法和X射线光发射光谱法,我们分别研究了酞菁铜(CuPc)膜与镓极性(Ga极性)和氮极性(N极性)GaN表面之间的界面电子性能。在沉积CuPc膜之前,干净的Ga极性和N极性表面分别表现出约0.6和0.13 eV的向上弯曲,表明电子态对表面终止和生长方向的影响。随着CuPc超薄层的沉积,Ga极性异质界面未观察到其他带弯曲或电荷位移。相比之下,仅沉积CuPc单层时,N极性界面显示出另外的0.54 eV带弯曲,这归因于从GaN到CuPc的部分电子位移。两种情况之间的差异是根据N极和Ga极GaN表面的电子亲和力之间的差异来解释的。考虑到潜在的器件用途,制造了GaN / CuPc混合光电探测器器件,并对其光电流响应进行了研究,以作为光电传感器的可能应用。

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  • 来源
    《Journal of Applied Physics》 |2010年第11期|P.113707.1-113707.6|共6页
  • 作者单位

    Division of Engineering and Department of Physics, Brown University, Providence, Rhode Island 02912, USA;

    rnDepartment of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA;

    rnDepartment of Electrical Engineering, Yale University, New Haven, Connecticut 06520, USA;

    rnDepartment of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA;

    rnDepartment of Electrical Engineering, Yale University, New Haven, Connecticut 06520, USA;

    rnDivision of Engineering and Department of Physics, Brown University, Providence, Rhode Island 02912, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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