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Effect of intrinsic tensile stress on (001) orientation in L1_0 FePt thin films on glass substrates

机译:固有拉伸应力对玻璃基板上L1_0 FePt薄膜中(001)取向的影响

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摘要

Single-layered FePt thin films were deposited on glass substrates and subsequently annealed at 800 ℃ for various times in a rapid thermal annealing (RTA) furnace. Near-fully-L1_0-ordered FePt films were obtained after RTA. The accumulation of the intrinsic tensile stress is mainly contributed by the densification reaction, which leads to the development of (001) preferred orientation. The relief of the tensile stress predominantly stems from the microstructural variation (from continuous to interconnected network state), resulting in a reduction of (001) texture. Enhanced perpendicular magnetic and crystalline anisotropy was obtained for the films annealed for 900 s, confirmed by a high Lotgering orientation factor of 0.99 and differential squareness of 0.5. The results provide direct evidence that intrinsic tensile stress prompts the (001) preferred orientation through suggested strain-induced grain growth.
机译:将单层FePt薄膜沉积在玻璃基板上,然后在快速热退火(RTA)炉中于800℃退火多次。 RTA后获得了接近L1_0级的FePt膜。固有拉伸应力的积累主要是由致密化反应引起的,这导致了(001)优选取向的发展。拉应力的缓解主要源于微观结构的变化(从连续到互连的网络状态),从而导致(001)织构的减少。退火900 s的薄膜获得了增强的垂直磁各向异性和结晶各向异性,这是由0.99的高洛格取向因子和0.5的方差矩形证实的。结果提供了直接的证据,即固有的拉应力通过建议的应变诱导晶粒生长提示了(001)首选取向。

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  • 来源
    《Journal of Applied Physics》 |2012年第2期|p.07A702.1-07A702.3|共3页
  • 作者单位

    National Synchrotron Radiation Research Center, Hsinchu, 30077, Taiwan;

    Department of Materials Science and Engineering, Feng Chia University, Taichung, 40724, Taiwan;

    Department of Materials Science and Engineering, Feng Chia University, Taichung, 40724, Taiwan;

    Institude of Applied Physics and Center for Nanostorage, National Taiwan University, Taipei, 106, Taiwan;

    National Synchrotron Radiation Research Center, Hsinchu, 30077, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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