Sputter-prepared BiFeO_3(001) films on L1_0 FePt(001)/glass substrates

摘要

The preparation of BFO films by sputtering at a temperature as low as 450 ℃ on glass and commercial Pt/Ti/SiO_2/Si(001) substrates have been studied. The underlayers with different orientations were prepared on the glass substrates including strongly textured Pt(111) and L1_0-FePt(001) induced by rapid thermal annealing process. Isotropic perovskite BFO grains with size of about 200 nm formed on the commercial substrates, showing larger surface roughness. Pt(111) suppresses BiFeO_3 phase. Single phase perovskite BFO with strong (001) texture, reduced surface roughness and fine grain size was formed on the L1_0-FePt(001) buffer layer. Considerable enhancement of ferroelectric properties was achieved as compared to the films grown on commercial substrate.