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Improved performance of multilayer InAs/GaAs quantum-dot solar cells using a high-growth-temperature GaAs spacer layer

机译:使用高生长温度的GaAs间隔层改善了多层InAs / GaAs量子点太阳能电池的性能

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摘要

The use of high-growth-temperature GaAs spacer layers is demonstrated to significantly enhance the performance of multilayer InAs/GaAs quantum-dot solar cells. Threading dislocations are observed for a 30-layer quantum-dot structure with GaAs spacer layers grown at low temperature (510 ℃). The formation of threading dislocations is suppressed by growing the GaAs spacer layer at high temperature (580 ℃), leading to enhanced quantum-dot optical and structural characteristics. Incorporation of the high-growth-temperature GaAs spacer layers into a 30-layer InAs/GaAs quantum-dot solar cell results in a dramatic increase in the short-circuit current compared to the one without the high-growth-temperature spacer layers and an increase in the short-circuit current compared to the reference GaAs solar cell.
机译:事实证明,使用高生长温度的GaAs间隔层可以显着提高多层InAs / GaAs量子点太阳能电池的性能。在低温(510℃)下生长GaAs间隔层的30层量子点结构中观察到了螺纹位错。通过在高温(580℃)下生长GaAs间隔层可以抑制螺纹位错的形成,从而增强量子点的光学和结构特性。与没有高生长温度隔离层和没有高生长温度隔离层的情况相比,将高生长温度的GaAs隔离层结合到30层InAs / GaAs量子点太阳能电池中会导致短路电流急剧增加。与参考GaAs太阳能电池相比,短路电流增加。

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  • 来源
    《Journal of Applied Physics》 |2012年第4期|p.046101.1-046101.3|共3页
  • 作者单位

    Department of Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, United Kingdom;

    Sharp Laboratories of Europe Ltd, Edmund Halley Road, Oxford Science Park, Oxford OX4 4GB, United Kingdom;

    Decanato Facultad de Ciencias Nduticas, CASEM, Poligono Rio San Pedro s.n. CP, Puerto Real, Cadiz' 11510, Spain;

    Decanato Facultad de Ciencias Nduticas, CASEM, Poligono Rio San Pedro s.n. CP, Puerto Real, Cadiz' 11510, Spain;

    Department of Materials, University of Oxford, Park Road, Oxford 0X1 3PH, United Kingdom;

    Department of Materials, University of Oxford, Park Road, Oxford 0X1 3PH, United Kingdom;

    Department of Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, United Kingdom;

    Department of Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, United Kingdom;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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