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X-ray microbeam three-dimensional topography for dislocation strain-field analysis of 4H-SiC

机译:用于4H-SiC位错应变场分析的X射线微束三维形貌

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摘要

This paper describes the strain-field analysis of threading edge dislocations (TEDs) and basal-plane dislocations (BPDs) in 4H-SiC using x-ray microbeam three-dimensional (3D) topography. This 3D topography enables quantitative strain-field analysis, which measures images of effective misorientations (Δω maps) around the dislocations. A deformation-matrix-based simulation algorithm is developed to theoretically evaluate the Aco mapping. Systematic linear calculations can provide simulated Δω maps (Δω_(sim) maps) of dislocations with different Burgers vectors, directions, and reflection vectors for the desired cross-sections. For TEDs and BPDs, Δω maps are compared with Δω_(sim) maps, and their excellent correlation is demonstrated. Two types of asymmetric reflections, high- and low-angle incidence types, are compared. Strain analyses are also conducted to investigate BPD-TED conversion near an epilayer/substrate interface in 4H-SiC.
机译:本文介绍了使用X射线微束三维(3D)形貌对4H-SiC中的螺纹边缘位错(TED)和基面位错(BPD)进行应变场分析。这种3D地形可实现定量应变场分析,该分析可测量位错周围有效错位的图像(Δω图)。开发了基于变形矩阵的仿真算法,以从理论上评估Aco映射。系统线性计算可以为所需横截面提供具有不同Burgers矢量,方向和反射矢量的位错的模拟Δω映射(Δω_(sim)映射)。对于TED和BPD,将Δω映射图与Δω_(sim)映射图进行比较,并证明了它们的出色相关性。比较了两种类型的非对称反射,即高角度入射角和低角度入射角。还进行了应变分析,以研究4H-SiC中外延层/衬底界面附近的BPD-TED转化。

著录项

  • 来源
    《Journal of Applied Physics》 |2013年第2期|023511.1-023511.8|共8页
  • 作者单位

    Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka 240-0196, Japan;

    Fuji Electric Co., Ltd., 1 Fuji-machi, Hino, Tokyo 191-8502, Japan;

    Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka 240-0196, Japan;

    Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka 240-0196, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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