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首页> 外文期刊>Journal of Applied Physics >Study of strain propagation in laser irradiated silicon crystal by time-resolved diffraction of K-α x-ray probe of different photon energies
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Study of strain propagation in laser irradiated silicon crystal by time-resolved diffraction of K-α x-ray probe of different photon energies

机译:利用不同光子能量的K-αx射线探针的时间分辨衍射研究激光辐照硅晶体中的应变传播

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摘要

An experimental study on the time resolved x-ray diffraction from laser shocked silicon crystal, carried out using a 10 TW Ti:sapphire laser system, is presented. The characteristic K_α x-ray line radiation generated by 45 fs laser produced plasmas of two different target materials (iron and copper) is used as the probe, whereas the stretched pulse of sub-nanosecond duration (pump), derived from the same laser, is used to compress the sample. The use of x-ray probe of different photon energies yields information about the strain over a greater crystal depth. The dynamics of the strain propagation is inferred by monitoring the evolution of rocking curve width of the shocked sample at different time delays between the pump and the probe pulse. The shock velocity deduced from these measurements is ~10~6cm/s, consistent with the sound velocity in bulk silicon. The maximum elastic compression observed is 0.4%, indicating a pressure of 0.8 GPa.
机译:提出了使用10 TW Ti:蓝宝石激光系统对激光冲击的硅晶体进行时间分辨X射线衍射的实验研究。由45 fs激光产生的两种不同目标材料(铁和铜)等离子体产生的特征K_αx射线线辐射用作探针,而亚纳秒持续时间(泵浦)的扩展脉冲源自同一激光,用于压缩样品。使用不同光子能量的X射线探测器会产生有关更大晶体深度上的应变的信息。通过监测泵浦和探针脉冲之间不同时间延迟处的冲击样品的摇摆曲线宽度的变化,可以推断出应变传播的动力学。通过这些测量得出的冲击速度为〜10〜6cm / s,与体硅中的声速一致。观察到的最大弹性压缩为0.4%,表明压力为0.8 GPa。

著录项

  • 来源
    《Journal of Applied Physics》 |2013年第2期|023302.1-023302.5|共5页
  • 作者单位

    Laser Plasma Division, Raja Ramanna Centre for Advanced Technology, Indore 452 013, India;

    Laser Plasma Division, Raja Ramanna Centre for Advanced Technology, Indore 452 013, India;

    UGC-DAE Consortium for Scientific Research, University Campus, Indore 452 001, India;

    Laser Plasma Division, Raja Ramanna Centre for Advanced Technology, Indore 452 013, India;

    UGC-DAE Consortium for Scientific Research, University Campus, Indore 452 001, India;

    Laser Plasma Division, Raja Ramanna Centre for Advanced Technology, Indore 452 013, India;

    UGC-DAE Consortium for Scientific Research, University Campus, Indore 452 001, India;

    Laser Plasma Division, Raja Ramanna Centre for Advanced Technology, Indore 452 013, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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