机译:四方SrRuO_3薄膜的外延应变效应
Institute/or Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan;
Institute/or Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan;
Institute/or Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan,Japan Science and Technology Agency, CREST, Uji, Kyoto 611-0011, Japan;
Institute/or Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan,Japan Science and Technology Agency, CREST, Uji, Kyoto 611-0011, Japan;
机译:四边形-四角形-单斜晶-菱面体过渡:严重压缩的BiFeO3外延薄膜的应变松弛
机译:四边形-四角形-单斜晶-菱面体过渡:严重压缩的BiFeO_3外延薄膜的应变松弛
机译:应变对SrRuO_3外延薄膜热电性能的影响
机译:硅衬底上异质外延SrRuO_3薄膜的制备及其在SrRuO_3底部电极上沉积的BaTiO_3-NiFe_2O_4外延复合薄膜的微观结构
机译:相关氧化物薄膜磁输出的外延应变和铁电场效应调制
机译:(100)/(001)取向四方外延Pb(Zr0.4Ti0.6)O3薄膜在电场作用下超快90°域转换的原位观察
机译:四方状态来自金属薄膜上的外延应变