首页> 外文期刊>Journal of Applied Physics >Epitaxial strain effect in tetragonal SrRuO_3 thin films
【24h】

Epitaxial strain effect in tetragonal SrRuO_3 thin films

机译:四方SrRuO_3薄膜的外延应变效应

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

We report on our characterization of the structural, electrical, and magnetic properties of tetragonal SrRuO_3 (SRO) thin films stabilized under both compressive and tensile strain. These tetragonal films consisting of the deformed RuO_6 octahedra without rotations were coherently grown on (110)_(ortho) NdGaO_3 and (110)_(ortho) GdScO_3 substrates, which provide compressive (-1.7%) and tensile (+1.0%) strains, respectively. The ferromagnetic transition temperature T_C for the compressively strained film is found to be as high as 155 K, while T_C of the film under tensile strain is only 100 K. The longitudinal resistivity ρ_(xx) of the compressively strained films is lower than that of the films under the tensile strain. This is attributed to the enhanced mobility for the compressive-strain case. The magnetic anisotropy also exhibits strong dependence on the substrate-induced epitaxial strain. The film under the compressive strain has the uniaxial magnetic easy axis along the out-of-plane direction, while the easy axis of the film under the tensile strain lies along the in-plane direction parallel to the [1-10]_(GSO) one. The results demonstrate that the electrical and magnetic properties of the tetragonal SRO thin films are closely related to the RuO_6 octahedral deformations due to the substrate-induced strain.
机译:我们报告了在压缩和拉伸应变下稳定的四方SrRuO_3(SRO)薄膜的结构,电学和磁学性质的表征。这些由不旋转而变形的RuO_6八面体组成的四方膜在(110)_(邻)NdGaO_3和(110)_(邻)GdScO_3衬底上相干生长,这些衬底提供压缩应变(-1.7%)和拉伸应变(+ 1.0%) , 分别。压缩应变薄膜的铁磁转变温度T_C高达155 K,而拉伸应变薄膜的T_C仅100K。压缩应变薄膜的纵向电阻率ρ_(xx)低于纵向应变率。薄膜在拉伸应变下。这归因于压缩应变情况下增强的移动性。磁各向异性也表现出对衬底诱导的外延应变的强烈依赖性。压缩应变下的薄膜沿面外方向具有单轴磁易轴,而拉伸应变下的薄膜易轴沿平行于[1-10] _(GSO )一。结果表明,由于基底诱导的应变,四方SRO薄膜的电学和磁学性质与RuO_6八面体形变密切相关。

著录项

  • 来源
    《Journal of Applied Physics》 |2013年第1期|173912.1-173912.7|共7页
  • 作者单位

    Institute/or Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan;

    Institute/or Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan;

    Institute/or Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan,Japan Science and Technology Agency, CREST, Uji, Kyoto 611-0011, Japan;

    Institute/or Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan,Japan Science and Technology Agency, CREST, Uji, Kyoto 611-0011, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号