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Enhancement mechanism of terahertz radiation from coherent longitudinal optical phonons in undoped GaAs-type GaAs epitaxial structures

机译:非掺杂GaAs / n型GaAs外延结构中相干纵向光子的太赫兹辐射增强机制

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摘要

We have investigated the characteristics of monochromatic terahertz electromagnetic waves emitted from coherent longitudinal optical (LO) phonons in undoped GaAs-type GaAs epitaxial structures with various thicknesses, which range from 200 nm to 1200 nm, of the undoped GaAs layer. The terahertz waves were measured at room temperature using an optical gating method with a photoconductive dipole antenna. It was found that the intensity of the terahertz waves markedly depends on the thickness of the undoped GaAs layer. The analysis of Franz-Keldysh oscillations observed with photoreflectance spectroscopy demonstrates that the built-in electric field strength in the undoped GaAs layer, which results from the Fermi-level pinning at the surface, increases from 6.1 kV/cm to 28.4 kV/cm with a decrease in the thickness. It was revealed that the amplitude of the terahertz wave is proportional to the electric field strength in the undoped GaAs layer. This fact indicates that the efficiency of the terahertz radiation is dominated by the initial polarization of the LO phonons induced by the built-in electric field, which provides us a simple strategy for the enhancement of the terahertz radiation from the coherent LO phonons.
机译:我们研究了无掺杂GaAs层的未掺杂GaAs / n型GaAs外延结构中相干纵向光学(LO)声子发出的单色太赫兹电磁波的特性,该厚度范围从200 nm至1200 nm。太赫兹波是在室温下使用带有光电导偶极子天线的光学选通方法测量的。发现太赫兹波的强度明显取决于未掺杂的GaAs层的厚度。用光反射光谱法观察到的Franz-Keldysh振荡分析表明,未掺杂的GaAs层中的内在电场强度(由表面的费米能级钉扎产生)从6.1 kV / cm增加到28.4 kV / cm。厚度减小。揭示了太赫兹波的振幅与未掺杂的GaAs层中的电场强度成比例。这一事实表明,太赫兹辐射的效率主要受内置电场引起的LO声子的初始极化支配,这为我们提供了一种增强相干LO声子的太赫兹辐射的简单策略。

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  • 来源
    《Journal of Applied Physics》 |2013年第14期|143502.1-143502.5|共5页
  • 作者单位

    Department of Applied Physics, Graduate School of Engineering, Osaka City University, Sugimoto,Sumiyoshi-ku, Osaka 558-8585, Japan;

    Department of Applied Physics, Graduate School of Engineering, Osaka City University, Sugimoto,Sumiyoshi-ku, Osaka 558-8585, Japan;

    Tsukuba Research Laboratory, Sumitomo Chemical Co. Ltd, 6 Kitahara, Tsukuba, Ibaraki 300-3294, Japan;

    Tsukuba Research Laboratory, Sumitomo Chemical Co. Ltd, 6 Kitahara, Tsukuba, Ibaraki 300-3294, Japan;

    Department of Applied Physics, Graduate School of Engineering, Osaka City University, Sugimoto,Sumiyoshi-ku, Osaka 558-8585, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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