首页> 外文期刊>Journal of Applied Physics >Reversible control of magnetic domains in a Tb_(0.3)Dy_(0.7)Fe_2/Pt/PbZr_(0.56)Ti_(0.44)O_3 thin film heterostructure deposited on Pt/TiO_2/SiO_2/Si substrate
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Reversible control of magnetic domains in a Tb_(0.3)Dy_(0.7)Fe_2/Pt/PbZr_(0.56)Ti_(0.44)O_3 thin film heterostructure deposited on Pt/TiO_2/SiO_2/Si substrate

机译:Pt / TiO_2 / SiO_2 / Si衬底上沉积的Tb_(0.3)Dy_(0.7)Fe_2 / Pt / PbZr_(0.56)Ti_(0.44)O_3薄膜异质结构中磁畴的可逆控制

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摘要

Tb_(0.3)Dy_(0.7)Fe_2/Pt/PbZr_(0.56)Ti_(0.44)O_3 (Terfenol-D/Pt/PZT) magnetoelectric (ME) thin films were deposited on Pt/TiO_2/SiO_2/Si substrate. Ferroelectric and magnetic properties were characterized at room temperature. At zero dc magnetic field and out of mechanical resonance, a variation of the voltage across the ferroelectric film was obtained when a small external ac magnetic field was applied to the device. The corresponding ME voltage coefficient was 1.27 V/cm Oe. On the same sample, local magnetic domain patterns were imaged by magnetic force microscopy. Reversible changes in magnetic domain patterns were observed when a dc electric field of 120 to 360 kV/cm was applied to the ferroelectric layer. These results confirm that both magnetic control of ferroelectric polarization and electric control of magnetization are achievable on ME thin films devices deposited on silicon substrates.
机译:将Tb_(0.3)Dy_(0.7)Fe_2 / Pt / PbZr_(0.56)Ti_(0.44)O_3(Terfenol-D / Pt / PZT)磁电(ME)薄膜沉积在Pt / TiO_2 / SiO_2 / Si衬底上。在室温下表征铁电和磁性。在直流磁场为零且没有机械共振的情况下,当向设备施加较小的外部交流磁场时,铁电薄膜上的电压会发生变化。相应的ME电压系数为1.27 V / cm Oe。在同一样品上,通过磁力显微镜对局部磁畴图案成像。当向铁电层施加120至360 kV / cm的直流电场时,观察到磁畴图案的可逆变化。这些结果证实了在沉积在硅衬底上的ME薄膜器件上既可以实现铁电极化的磁控制也可以实现磁化的电控制。

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  • 来源
    《Journal of Applied Physics》 |2014年第21期|214102.1-214102.5|共5页
  • 作者单位

    Universite de Caen Basse-Normandie, UMR 6508 CRISMAT, F-14032 Caen, France,ENSICAEN, UMR 6508 CRISMAT, F-14050 Caen, France,CNRS, UMR 6508 CRISMAT, F-14050 Caen, France;

    Univ Lille Nord de France, F-59000 Lille, France,CNRS, UMR 8181, Unite de Catalyse et de Chimie du Solide-UCCS, F-59650 Villeneuve d'Ascq, France,UArtois, UMR 8181, UCCS, F-62300 Lens, France;

    Universite de Caen Basse-Normandie, UMR 6508 CRISMAT, F-14032 Caen, France,ENSICAEN, UMR 6508 CRISMAT, F-14050 Caen, France,CNRS, UMR 6508 CRISMAT, F-14050 Caen, France;

    Universite de Caen Basse-Normandie, UMR 6508 CRISMAT, F-14032 Caen, France,ENSICAEN, UMR 6508 CRISMAT, F-14050 Caen, France,CNRS, UMR 6508 CRISMAT, F-14050 Caen, France;

    Univ Lille Nord de France, F-59000 Lille, France,CNRS, UMR 8181, Unite de Catalyse et de Chimie du Solide-UCCS, F-59650 Villeneuve d'Ascq, France,UArtois, UMR 8181, UCCS, F-62300 Lens, France;

    Universite de Caen Basse-Normandie, UMR 6508 CRISMAT, F-14032 Caen, France,ENSICAEN, UMR 6508 CRISMAT, F-14050 Caen, France,CNRS, UMR 6508 CRISMAT, F-14050 Caen, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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