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Molecular dynamics simulation of graphene growth on Ni(100) facet by chemical vapor deposition

机译:化学气相沉积在Ni(100)面上生长石墨烯的分子动力学模拟

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摘要

We present a molecular dynamics simulation of chemical vapor deposition of graphene. Single layer graphene growth on a Ni (100) facet was studied at different substrate temperatures, C flow rates, and C flow energies. Results show that a single layer graphene film grows through a combined deposition mechanism on a Ni substrate, rather than by surface segregation. These simulations suggest that high quality graphene deposition is theoretically possible on Ni (100) facet under high flux energy.
机译:我们提出了石墨烯化学气相沉积的分子动力学模拟。研究了在不同衬底温度,C流速和C流动能下Ni(100)面上单层石墨烯的生长。结果表明,单层石墨烯薄膜是通过在镍衬底上的组合沉积机制而不是通过表面偏析来生长的。这些模拟表明,在高通量能量下,理论上可以在Ni(100)面上进行高质量的石墨烯沉积。

著录项

  • 来源
    《Journal of Applied Physics》 |2014年第2期|024311.1-024311.4|共4页
  • 作者单位

    Department of Physics, Faculty of Science, University of Zanjan, Zanjan, Iran;

    Department of Physics, Faculty of Science, University of Zanjan, Zanjan, Iran;

    Department of Physics, Faculty of Science, University of Zanjan, Zanjan, Iran;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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