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机译:电子束蒸发制备的Al-Tb / SiO_2多层膜的结构和光学性能
MIND-IN~2UB, Department of Engineering: Electronics, Universitat de Barcelona, Marti i Franques 1, E-08028 Barcelona, Spain;
MIND-IN~2UB, Department of Engineering: Electronics, Universitat de Barcelona, Marti i Franques 1, E-08028 Barcelona, Spain,IMTEK, Faculty of Engineering, Albert-Ludwigs-University Freiburg, Georges-Koehler-Allee 103, D-79110 Freiburg, Germany;
MIND-IN~2UB, Department of Engineering: Electronics, Universitat de Barcelona, Marti i Franques 1, E-08028 Barcelona, Spain;
MIND-IN~2UB, Department of Engineering: Electronics, Universitat de Barcelona, Marti i Franques 1, E-08028 Barcelona, Spain;
MIND-IN~2UB, Department of Engineering: Electronics, Universitat de Barcelona, Marti i Franques 1, E-08028 Barcelona, Spain;
MIND-IN~2UB, Department of Engineering: Electronics, Universitat de Barcelona, Marti i Franques 1, E-08028 Barcelona, Spain;
MIND-IN~2UB, Department of Engineering: Electronics, Universitat de Barcelona, Marti i Franques 1, E-08028 Barcelona, Spain;
MIND-IN~2UB, Department of Engineering: Electronics, Universitat de Barcelona, Marti i Franques 1, E-08028 Barcelona, Spain;
机译:电子束蒸发技术制备的ZnSe薄膜的基体温度相关结构和光学性质
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机译:电子束蒸发制备Al-Tb / SiO2多层膜的结构和光学性能
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