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Structure, strain, and composition profiling of InAs/GaAs(211)B quantum dot superlattices

机译:InAs / GaAs(211)B量子点超晶格的结构,应变和组成分析

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摘要

The morphology, nanostructure, and strain properties of InAs quantum dots (QDs) grown on GaAs(211)B, uncapped or buried, are explored by transmission electron microscopy and related quantitative techniques. Besides the built-in piezoelectric field, other differences of (211) growth compared to (100)-oriented growth are discussed in terms of the (211) surface non-singularity, leading to anisotropic shape of the QDs and local chemical inhomogeneity of the wetting layer. The shape of the uncapped QDs was precisely denned as truncated pyramidal, elongated along the <111> direction, and bounded by the {110}, (100}, and {213} facets. Local strain measurements showed that large surface QDs were almost unstrained due to plastic relaxation, exhibiting small residual elastic strain at the interface that gradually diminished toward their apex. Conversely, buried QDs were pseudomorphically grown on GaAs. By postulating a plane stress state, we have established a systematic increase of the local strain from the base toward the apex region of the QDs. Using Vegard's law, their chemical composition profiles were calculated, revealing an indium content gradient along the growth direction and compositional variants among different QDs. Photoluminescence measurements showed variations in emission energy between the QDs and consistency with a graded In-content, which complied with the quantitative strain analysis.
机译:通过透射电子显微镜和相关的定量技术,研究了未盖或埋在GaAs(211)B上的InAs量子点(QD)的形貌,纳米结构和应变特性。除了内置的压电场外,还讨论了(211)生长与(100)取向生长之间的其他差异,包括(211)表面非奇异性,从而导致了量子点的各向异性形状和QD的局部化学不均匀性。润湿层。未封盖的量子点的形状精确地定义为截棱锥状,沿<111>方向拉长,并以{110},(100}和{213}面为边界,局部应变测量表明大表面量子点几乎没有应变由于塑性松弛,在界面处表现出较小的残余弹性应变,并逐渐向其顶点减小;相反,掩埋的量子点在GaAs上以假晶生长,通过假设平面应力状态,我们确定了基部局部应变的系统性增加根据维加德定律,计算了它们的化学成分分布,揭示了沿生长方向的铟含量梯度和不同量子点之间的组成变化;光致发光测量结果显示了量子点之间的发射能量变化以及梯度的一致性含量符合定量应变分析。

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  • 来源
    《Journal of Applied Physics》 |2016年第3期|034304.1-034304.8|共8页
  • 作者单位

    Physics Department, Aristotle University of Thessaloniki, 54624 Thessaloniki, Greece;

    Physics Department, Aristotle University of Thessaloniki, 54624 Thessaloniki, Greece;

    Physics Department, Aristotle University of Thessaloniki, 54624 Thessaloniki, Greece;

    Department of Materials Science and Technology, University of Crete, P.O. Box 2208, 70013 Heraklion, Greece,Microelectronics Research Group, IESL-FORTH, P.O. Box 1385, 71110 Heraklion, Greece;

    Department of Materials Science and Technology, University of Crete, P.O. Box 2208, 70013 Heraklion, Greece;

    Microelectronics Research Group, IESL-FORTH, P.O. Box 1385, 71110 Heraklion, Greece,Department of Physics, University of Crete, P.O. Box 2208, 70013 Heraklion, Greece;

    Department of Materials Science and Technology, University of Crete, P.O. Box 2208, 70013 Heraklion, Greece,Microelectronics Research Group, IESL-FORTH, P.O. Box 1385, 71110 Heraklion, Greece;

    Physics Department, Aristotle University of Thessaloniki, 54624 Thessaloniki, Greece;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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