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Optical and other physical properties of hydrophobic ZnO thin films prepared by dc magnetron sputtering at room temperature

机译:室温下通过直流磁控溅射制备的疏水性ZnO薄膜的光学和其他物理性质

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摘要

Highly ordered and hydrophobic zinc oxide thin films have been synthesized by dc magnetron sputtering on the glass substrates at room temperature (RT). We have determined the influence of deposition parameters on the optical and other physical properties of the films, and the correlation between their microstructural and optical properties. Films have preferred (002) orientation, an average crystallite size ≤26 nm, and rms surface roughness ≤14 nm. The water contact angle of 120° exceeds previous measurements by over 10°-20°. Dispersion of the refractive index is analyzed in terms of the Wemple-DiDomenical single-oscillator model, and the third-order nonlinear optical parameters are calculated using the Tichy and Ticha relation. Refractive indices of 1.9686 at 540 nm are near the bulk value of 2.0041. Produced at RT, these highly ordered films may be promising candidates for compact optoelectronic devices.
机译:在室温下,通过直流磁控溅射在玻璃基板上合成了高度有序的疏水性氧化锌薄膜。我们已经确定了沉积参数对薄膜的光学和其他物理性质的影响,以及它们的微观结构和光学性质之间的相关性。薄膜具有较好的(002)取向,平均微晶尺寸≤26nm,均方根表面粗糙度≤14nm。 120°的水接触角比以前的测量值超出10°-20°。根据Wemple-DiDomenical单振荡器模型分析折射率的色散,并使用Tichy和Ticha关系计算三阶非线性光学参数。 540 nm处的折射率1.9686接近体积值2.0041。在RT上生产的这些高度有序的薄膜可能是紧凑型光电器件的有希望的候选者。

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  • 来源
    《Journal of Applied Physics》 |2017年第14期|143105.1-143105.11|共11页
  • 作者单位

    Thin Film Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee, India;

    Thin Film Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee, India;

    Thin Film Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee, India;

    Thin Film Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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