首页> 外文期刊>Journal of Analytical Atomic Spectrometry >Quantitative synchrotron micro-XRF study of CoTSPc and CuTSPc thin-films deposited on gold by cyclic voltammetry
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Quantitative synchrotron micro-XRF study of CoTSPc and CuTSPc thin-films deposited on gold by cyclic voltammetry

机译:循环伏安法在金上沉积CoTSPc和CuTSPc薄膜的定量同步加速微XRF研究

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摘要

Synchrotron radiation X-ray fluorescence (SR-XRF) spectroscopy has been applied for the microscopic characterization of (II) tetrasulfonated phthalocyanine (CoTSPc) and copper(II)3,4',4",4 "-tetrasulfonated phthalocyanine (CuTSPc) thin films electrochemically deposited on gold electrodes. The deposited thin-film properties have been studied as a function of phthalocyanine concentration in solution during the modification process. The Co and Cu surface concentrations on the modified gold electrodes have been determined on the 20 and 600 μm levels. The SR-XRF quantification procedure and micro-heterogeneity determination of the CoTSPc and CuTSPc thin-films on the gold electrodes have been described in detail. The detailed comparison of scanning SR-XRF results with electrochemical data makes it possible to gain further insight in the mechanism of thin layer growth during the modification procedure.
机译:同步辐射X射线荧光(SR-XRF)光谱已用于(II)四磺化酞菁(CoTSPc)和铜(II)3,4',4“,4”-四磺化酞菁(CuTSPc)的微观表征膜电化学沉积在金电极上。在改性过程中,已研究了沉积的薄膜性能与溶液中酞菁浓度的关系。改性金电极上的Co和Cu表面浓度已确定在20和600μm的水平上。详细介绍了金电极上CoTSPc和CuTSPc薄膜的SR-XRF定量程序和微异质性测定。扫描SR-XRF结果与电化学数据的详细比较,可以在修饰过程中进一步了解薄层生长的机理。

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