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Evaluation of silicon carbide Schottky barrier diode within guard ring by multifunctional scanning probe microscopy

机译:多功能扫描探针显微镜测定保护环内碳化硅肖特基势垒二极管

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摘要

An evaluation method based on multifunctional scanning probe microscopy enables the nanoscale observation of power semiconductor devices. Herein, we report the results of the evaluation of a power device performed by frequency-modulation atomic force microscopy, Kelvin probe force microscopy (KPFM), and scanning capacitance force microscopy (SCFM). The evaluation sample is a commercially available silicon carbide Schottky barrier diode (SiC-SBD) with a breakdown voltage of 1200 V. In this study, we focus on the termination structure of the SiC-SBD. The termination structure such as guard ring can improve the breakdown voltage of SBD. In particular, we measured the dopant distribution and surface potential by SCFM and KPFM, respectively. We report the first observation results of the p-layer of the guard ring and the first evaluation of the relaxation effect of the electric field by the p-layer. (C) 2020 The Japan Society of Applied Physics
机译:基于多功能扫描探针显微镜的评估方法实现了功率半导体器件的纳米级观察。在此,我们报告了通过频率调制原子力显微镜,开尔文探针力显微镜(KPFM)和扫描电容力显微镜(SCFM)进行的功率器件的评估结果。评价样品是商业上可获得的碳化硅肖特基势垒二极管(SiC-SBD),击穿电压为1200 V.在本研究中,我们专注于SiC-SBD的终止结构。终止结构如保护环可以改善SBD的击穿电压。特别地,我们分别通过SCFM和KPFM测量了掺杂剂分布和表面电位。我们报道了保护环P层的第一个观察结果,并通过P层对电场的弛豫效果进行了第一评价。 (c)2020日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2020年第sn期|SN1014.1-SN1014.6|共6页
  • 作者单位

    Chiba Inst Technol Grad Sch Engn Narashino Chiba 2750016 Japan;

    Chiba Inst Technol Grad Sch Engn Narashino Chiba 2750016 Japan;

    Chiba Inst Technol Grad Sch Engn Narashino Chiba 2750016 Japan|Chiba Inst Technol Fac Engn Narashino Chiba 2750016 Japan;

    Chiba Inst Technol Grad Sch Engn Narashino Chiba 2750016 Japan|Chiba Inst Technol Fac Engn Narashino Chiba 2750016 Japan;

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