...
机译:用升高的衬底温度和其表征通过一步溅射制造Cu(LN,Ga)S_XSE_(2-X)膜的制造
Shanghai Normal Univ Key Lab Optoelect Mat & Devices Math & Sci Coll Shanghai 200234 Peoples R China;
Shanghai Normal Univ Key Lab Optoelect Mat & Devices Math & Sci Coll Shanghai 200234 Peoples R China;
Shanghai Normal Univ Key Lab Optoelect Mat & Devices Math & Sci Coll Shanghai 200234 Peoples R China;
Shanghai Normal Univ Key Lab Optoelect Mat & Devices Math & Sci Coll Shanghai 200234 Peoples R China;
Shanghai Normal Univ Key Lab Optoelect Mat & Devices Math & Sci Coll Shanghai 200234 Peoples R China;
Shanghai Normal Univ Key Lab Optoelect Mat & Devices Math & Sci Coll Shanghai 200234 Peoples R China;
Shanghai Normal Univ Key Lab Optoelect Mat & Devices Math & Sci Coll Shanghai 200234 Peoples R China;
Shanghai Normal Univ Key Lab Optoelect Mat & Devices Math & Sci Coll Shanghai 200234 Peoples R China;
Shanghai Normal Univ Key Lab Optoelect Mat & Devices Math & Sci Coll Shanghai 200234 Peoples R China;
机译:在不同衬底温度下通过四元靶离子束溅射沉积制备Cu(In,Ga)Se_2薄膜
机译:共溅射期间沉积温度升高的多层Cu-W膜界面稳定性研究
机译:Cu
机译:基板温度对太阳能电池的一步磁控溅射Cu(In,Ga)Se2薄膜的影响
机译:在高温下溅射沉积的超弹性镍钛薄膜的加工,微观结构和热机械行为。
机译:射频磁控溅射在YBa2Cu3O7-δ涂层导体的不同缓冲结构上制备和表征La2Zr2O7膜
机译:用各种衬底温度产生射率磁控溅射的InGaN薄膜的详细结构和形态学
机译:高温下氧化铝基体上溅射au / Cr薄膜的摩擦学特性