首页> 外文期刊>Japanese journal of applied physics >Donor-acceptor pair emission via defects with strong electron-phonon coupling in heavily doped Al_xGa_(1-x)N:Si layers with Al content x>0.5
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Donor-acceptor pair emission via defects with strong electron-phonon coupling in heavily doped Al_xGa_(1-x)N:Si layers with Al content x>0.5

机译:供体受体对通过具有强掺杂AL_XGA_(1-X)N的强电子 - 声子耦合的缺陷发射:Si层与Al含量x> 0.5

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摘要

We report the results of time-resolved and temperature-dependent stationary photoluminescence investigations of the defects responsible for emission in the visible spectral range in heavily silicon-doped AlxGa1-xN layers grown by molecular beam epitaxy on sapphire substrates. The emission band was attributed to donor-acceptor transitions. The transitions were described using the one-dimensional configuration coordinate model taking into account the high-doping regime. An increase in Al content from 0.56 to 1 leads to an increase in the acceptor ionization energy from 1.4 to 1.87 eV. The value of the Franck-Condon shift is about 1 eV at x = 0.56-0.74 and decreases to 0.8 eV at x 0.74. The changes in the donor-acceptor transition energy parameters with increasing silicon concentration are discussed. (C) 2019 The Japan Society of Applied Physics
机译:我们报告了由Sapphire基材上的分子束外延生长的大硅掺杂的AlxGA1-XN层中的可见光谱范围中发射的缺陷的时间分辨和温度依赖的固定光致发光调查的结果。发射带归因于供体受影响的转变。使用一维配置坐标模型描述了过渡,考虑到高掺杂方案。 Al含量从0.56〜1的增加导致受体离子化能量增加到1.4至1.87eV。 Franck-Condon Shift的值在x = 0.56-0.74处约1eV,并在X> 0.74处减少至0.8eV。讨论了随着硅浓度增加的供体受转变能量参数的变化。 (c)2019年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2019年第sc期|SCCB27.1-SCCB27.7|共7页
  • 作者单位

    Russian Acad Sci Rzhanov Inst Semicond Phys Siberian Branch Novosibirsk 630090 Russia|Novosibirsk State Univ Novosibirsk 630090 Russia;

    Russian Acad Sci Rzhanov Inst Semicond Phys Siberian Branch Novosibirsk 630090 Russia;

    Russian Acad Sci Rzhanov Inst Semicond Phys Siberian Branch Novosibirsk 630090 Russia;

    Russian Acad Sci Voevodsky Inst Chem Kinet & Combust Siberian Branch Novosibirsk Russia|Novosibirsk State Univ Novosibirsk 630090 Russia;

    Russian Acad Sci Rzhanov Inst Semicond Phys Siberian Branch Novosibirsk 630090 Russia|Novosibirsk State Univ Novosibirsk 630090 Russia;

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