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首页> 外文期刊>Japanese journal of applied physics >Influence of Zn-Si donor-acceptor pair traps in invert InGaP/GaAs dual-junction solar cell by MOCVD
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Influence of Zn-Si donor-acceptor pair traps in invert InGaP/GaAs dual-junction solar cell by MOCVD

机译:MOCVD法反转InGaP / GaAs双结太阳能电池中Zn-Si供体-受体对陷阱的影响

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摘要

In In(Ga)P materials, Zn atoms diffuse into the adjacent Si doping layer at high temperatures, forming Zn-Si donor-acceptor pairs which function as non-radiation carrier recombination centers. The traps lead to decreased carrier diffusion length and separation efficiency in the space charge region of InGaP subcell, resulting in degradation of photoelectric conversion efficiency. In this paper, by adopting an InGaP p-i-n junction structure, the invert growth thin film cell was able to reach the same external quantum efficiency performance as the upright InGaP/GaAs dual-junction solar cell. The Zn doping peak was not observed at the Si doping interface layer in the electrochemical capacitance-voltage measurement. A 675 nm peak was observed at 5 and 30 K and absent in 77 K, as was resolved by low-temperature PL measurement. The peak showed a strong correlation with the Zn diffusion into adjacent Si doping InGaP layer. We speculate that the 675 nm peak represented the energy of Zn-Si donor- acceptor pair traps. (C) 2019 The Japan Society of Applied Physics
机译:在In(Ga)P材料中,Zn原子在高温下扩散到相邻的Si掺杂层中,形成Zn-Si供体-受体对,它们充当非辐射载流子复合中心。陷阱导致InGaP子电池的空间电荷区域中的载流子扩散长度和分离效率降低,导致光电转换效率降低。在本文中,通过采用InGaP p-i-n结结构,反向生长薄膜电池能够达到与直立式InGaP / GaAs双结太阳能电池相同的外部量子效率性能。在电化学电容-电压测量中,在Si掺杂界面层未观察到Zn掺杂峰。如通过低温PL测量所解析的,在5K和30K处观察到675nm的峰,而在77K处不存在。该峰与Zn扩散到相邻的Si掺杂InGaP层中显示出强烈的相关性。我们推测675 nm峰代表了Zn-Si供体-受体对陷阱的能量。 (C)2019日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2019年第8期|085502.1-085502.5|共5页
  • 作者单位

    Sun Yat Sen Univ, Sch Elect & Informat Technol, State Key Lab Optoelect Mat & Technol, Guangzhou 510006, Guangdong, Peoples R China;

    Uniwatt Technol CO Ltd, Zhongshan 528437, Peoples R China;

    Sun Yat Sen Univ, Sch Elect & Informat Technol, State Key Lab Optoelect Mat & Technol, Guangzhou 510006, Guangdong, Peoples R China;

    Sun Yat Sen Univ, Sch Elect & Informat Technol, State Key Lab Optoelect Mat & Technol, Guangzhou 510006, Guangdong, Peoples R China;

    Sun Yat Sen Univ, Sch Elect & Informat Technol, State Key Lab Optoelect Mat & Technol, Guangzhou 510006, Guangdong, Peoples R China;

    Sun Yat Sen Univ, Sch Elect & Informat Technol, State Key Lab Optoelect Mat & Technol, Guangzhou 510006, Guangdong, Peoples R China|Sun Yat Sen Univ, Foshan Inst, Foshan 528225, Peoples R China;

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