首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition
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Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition

机译:微波等离子体增强化学气相沉积法制备致密碳纳米管薄膜

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摘要

Carbon nanotubes (CNTs) were synthesized using microwave plasma-enhanced chemical vapor deposition. Co nanoparticles as catalyst were prepared using excimer laser ablation. Vertically aligned, dense CNT films were grown successfully on a Co-catalyzed Si substrate with a TiN buffer layer. The density of CNTs with a diameter of approximately 6 nm was controllable by changing the deposition time of Co catalytic nanoparticles prior to nanotube growth. CNTs were grown rapidly during the first 3 min of growth, then the growth rate of CNTs decreased markedly. At the early stage of growth, the CNTs grew at an extremely high rate of 300nm/s.
机译:使用微波等离子体增强化学气相沉积法合成了碳纳米管(CNT)。使用准分子激光烧蚀制备Co纳米颗粒作为催化剂。垂直排列的致密CNT膜成功地在带有TiN缓冲层的Co催化Si衬底上生长。通过改变在纳米管生长之前Co催化纳米颗粒的沉积时间,可以控制直径约为6nm的CNT的密度。 CNT在生长的前3分钟内迅速生长,然后CNT的生长速率显着下降。在生长的早期,CNT以300nm / s的极高速度生长。

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