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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Investigation of Surface Pits Originating in Dislocations in AlGaN/GaN Epitaxial Layer Grown on Si Substrate with Buffer Layer
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Investigation of Surface Pits Originating in Dislocations in AlGaN/GaN Epitaxial Layer Grown on Si Substrate with Buffer Layer

机译:带有缓冲层的Si衬底上生长的AlGaN / GaN外延层中位错引起的表面坑的研究

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摘要

An AlGaN/GaN heterostructural layer with a crack-free smooth surface was grown on multiple buffer layers formed on a Si(111) substrate. On the AlGaN surface, pit arrays forming a network structure were observed by atomic force microscopy (AFM). In order to clarify the origin of these pit arrays, the AlGaN/GaN layer was investigated using transmission electron microscopy (TEM). As a result, similar network structures of threading edge dislocations in the AlGaN/GaN layer were observed by plan-view TEM. It was thus confirmed that the surface pit arrays observed by AFM represent the surface termination of edge dislocations formed at the small-angle boundaries of slightly misoriented crystal domains.
机译:在形成于Si(111)基板上的多个缓冲层上生长具有无裂纹光滑表面的AlGaN / GaN异质结构层。在AlGaN表面上,通过原子力显微镜(AFM)观察到形成网络结构的凹坑阵列。为了阐明这些凹坑阵列的起源,使用透射电子显微镜(TEM)研究了AlGaN / GaN层。结果,通过平面观察TEM观察到AlGaN / GaN层中的螺纹边缘位错的类似网络结构。因此证实了通过AFM观察到的表面凹坑阵列代表了在位错取向的晶畴的小角度边界处形成的边缘位错的表面终止。

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